Compositionally graded AlGaN hole source layer for deep-ultraviolet nanowire light-emitting diode without electron blocking layer

2021 ◽  
Author(s):  
Muhammad Nawaz Sharif ◽  
Muhammad Usman ◽  
Mussaab Ibrahiam Niass ◽  
Juin J. Liou ◽  
Fang Wang ◽  
...  
2021 ◽  
Vol 158 ◽  
pp. 107022
Author(s):  
Muhammad Nawaz Sharif ◽  
Mussaab Ibrahim Niass ◽  
Juin J. Liou ◽  
Fang Wang ◽  
Yuhuai Liu

2013 ◽  
Vol 22 (10) ◽  
pp. 108505 ◽  
Author(s):  
Jian-Yong Xiong ◽  
Yi-Qin Xu ◽  
Fang Zhao ◽  
Jing-Jing Song ◽  
Bin-Bin Ding ◽  
...  

2014 ◽  
Vol 23 (6) ◽  
pp. 068502
Author(s):  
Xiang-Jing Zhuo ◽  
Jun Zhang ◽  
Dan-Wei Li ◽  
Han-Xiang Yi ◽  
Zhi-Wei Ren ◽  
...  

2020 ◽  
Vol 142 (3) ◽  
Author(s):  
Hongfeng Jia ◽  
Huabin Yu ◽  
Zhongjie Ren ◽  
Chong Xing ◽  
Zhongling Liu ◽  
...  

Abstract An aluminum-rich AlGaN layer is commonly implemented to act as an electron-blocking layer (EBL) to block electron overflow from the active region in the conventional deep-ultraviolet light-emitting diodes (DUV LEDs). Herein, we propose a DUV LED device architecture with specially designed band-engineered quantum barriers (QBs) to “serve” as an alternative approach to alleviate such overflow effect, suppressing the electron leakage, and facilitating the electron and hole injection into the active region for efficient radiative recombination. Intriguingly, a much smaller efficiency droop with a significant enhancement of light output power (LOP) by nearly 50% can be achieved at the injection current level of 120 mA in such EBL-free device, in comparison with the conventional EBL-incorporated DUV LED structure. Thus, the EBL-free device architecture provides us an alternative path toward the realization of efficient DUV light emitters.


2012 ◽  
Vol 24 (22) ◽  
pp. 1991-1994 ◽  
Author(s):  
Sang-Jun Lee ◽  
Chu-Young Cho ◽  
Sang-Hyun Hong ◽  
Sang-Heon Han ◽  
Sukho Yoon ◽  
...  

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