Continuum level-set model for anisotropic wet etching of patterned sapphire substrates

2021 ◽  
Vol 36 (4) ◽  
pp. 045016
Author(s):  
A Toifl ◽  
F Rodrigues ◽  
L F Aguinsky ◽  
A Hössinger ◽  
J Weinbub
CrystEngComm ◽  
2015 ◽  
Vol 17 (16) ◽  
pp. 3070-3075 ◽  
Author(s):  
S. X. Jiang ◽  
Z. Z. Chen ◽  
X. Z. Jiang ◽  
X. X. Fu ◽  
S. Jiang ◽  
...  

A novel method based on imprinting lithography and wet etching to fabricate a volcano-shaped patterned sapphire substrate (VPSS) is presented.


2014 ◽  
Vol 3 (5) ◽  
pp. N69-N74 ◽  
Author(s):  
Natsuko Aota ◽  
Hideo Aida ◽  
Yutaka Kimura ◽  
Yuki Kawamata ◽  
Michio Uneda

2014 ◽  
Vol 2014 ◽  
pp. 1-7 ◽  
Author(s):  
Hsu-Hung Hsueh ◽  
Sin-Liang Ou ◽  
Chiao-Yang Cheng ◽  
Dong-Sing Wuu ◽  
Ray-Hua Horng

InGaN light-emitting diodes (LEDs) were fabricated on cone-shaped patterned sapphire substrates (PSSs) by using low-pressure metalorganic chemical vapor deposition. To enhance the crystal quality of the GaN epilayer and the optoelectronic performance of the LED device, the top-tip cone shapes of the PSSs were further modified using wet etching. Through the wet etching treatment, some dry-etched induced damage on the substrate surface formed in the PSS fabrication process can be removed to achieve a high epilayer quality. In comparison to the LEDs prepared on the conventional sapphire substrate (CSS) and cone-shaped PSS without wet etching, the LED grown on the cone-shaped PSS by performing wet etching for 3 min exhibited 55% and 10% improvements in the light output power (at 350 mA), respectively. This implies that the modification of cone-shaped PSSs possesses high potential for LED applications.


2021 ◽  
pp. 149725
Author(s):  
Pengkun Li ◽  
Lilin Wang ◽  
Shujing Sun ◽  
Chaoyang Tu ◽  
Chenlong Chen

2019 ◽  
Vol 13 (1) ◽  
pp. 015504
Author(s):  
Nan Xie ◽  
Fujun Xu ◽  
Jiaming Wang ◽  
Yuanhao Sun ◽  
Baiyin Liu ◽  
...  

2013 ◽  
Vol 43 (4) ◽  
pp. 814-818 ◽  
Author(s):  
E. Richter ◽  
S. Fleischmann ◽  
D. Goran ◽  
S. Hagedorn ◽  
W. John ◽  
...  

2006 ◽  
Vol 203 (7) ◽  
pp. 1632-1635 ◽  
Author(s):  
K. Nakano ◽  
M. Imura ◽  
G. Narita ◽  
T. Kitano ◽  
Y. Hirose ◽  
...  

2021 ◽  
Vol 21 (9) ◽  
pp. 4881-4885
Author(s):  
Seung-Jae Lee ◽  
Seong-Ran Jeon ◽  
Young Ho Song ◽  
Young-Jun Choi ◽  
Hae-Gon Oh ◽  
...  

We report the characteristics of AlN epilayers grown directly on cylindrical-patterned sapphire substrates (CPSS) by hydride vapor-phase epitaxy (HVPE). To evaluate the effect of CPSS, we analyzed the threading dislocation densities (TDDs) of AlN films grown simultaneously on CPSS and flat sapphire substrate (FSS) by transmission electron microscopy (TEM). The corresponding TDD is measured to be 5.69 x 108 cm−2 for the AlN sample grown on the CPSS that is almost an order of magnitude lower than the value of 3.43 × 109 cm−2 on the FSS. The CPSS contributes to reduce the TDs originated from the AlN/sapphire interface via bending the TDs by lateral growth during the coalescence process. In addition, the reduction of direct interface area between AlN and sapphire by CPSS reduce the generation of TDs.


2021 ◽  
Author(s):  
Huabin Yu ◽  
Hongfeng Jia ◽  
Zhongling Liu ◽  
Muhammad Memon ◽  
Meng Tian ◽  
...  

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