scholarly journals Aluminum diffusion during laser-stimulated crystallization of thin silicon films

2021 ◽  
Vol 2103 (1) ◽  
pp. 012123
Author(s):  
S O Solodovnikova ◽  
L D Volkovoynova ◽  
A A Serdobintsev ◽  
A V Starodubov ◽  
I O Kozhevnikov ◽  
...  

Abstract Diffusion of aluminum in amorphous silicon films during crystallization through infrared laser irradiation was studied. Diffusion regime was found to change from limited source to abundant source diffusion at higher laser source power. At the same time, crystalline structure of the obtained samples becomes more perfect, which is more characteristic to limited source diffusion mode.

2011 ◽  
Vol 158 (1) ◽  
pp. H25 ◽  
Author(s):  
Rosa Ruggeri ◽  
Vittorio Privitera ◽  
Corrado Spinella ◽  
Enza Fazio ◽  
Fortunato Neri ◽  
...  

2010 ◽  
Vol 97 (2) ◽  
pp. 022107 ◽  
Author(s):  
Giovanni Mannino ◽  
Corrado Spinella ◽  
Rosa Ruggeri ◽  
Antonino La Magna ◽  
Giuseppe Fisicaro ◽  
...  

1993 ◽  
Author(s):  
E. Duco Jansen ◽  
Ravi K. Chundru ◽  
Salim A. Samanani ◽  
Todd A. Tibbetts ◽  
Ashley J. Welch

Author(s):  
T. Tanaka ◽  
I. Shiota ◽  
H. Suzuki ◽  
T. Noda

2019 ◽  
Vol 9 (1) ◽  
Author(s):  
Karol Vegso ◽  
Yanlin Wu ◽  
Hidekazu Takano ◽  
Masato Hoshino ◽  
Atsushi Momose

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