Free-carrier dynamics in low-temperature-grown GaAs at high excitation densities investigated by time-domain terahertz spectroscopy

2002 ◽  
Vol 65 (12) ◽  
Author(s):  
Gregor Segschneider ◽  
Frank Jacob ◽  
Torsten Löffler ◽  
Hartmut G. Roskos ◽  
Sönke Tautz ◽  
...  
2007 ◽  
Author(s):  
W. H. Fan ◽  
W. Zhao ◽  
G. H. Cheng ◽  
A. D. Burnett ◽  
P. C. Upadhya ◽  
...  

2004 ◽  
Vol 53 (6) ◽  
pp. 1772
Author(s):  
Hu Ying ◽  
Zhang Cun-Lin ◽  
Shen Jing-Ling ◽  
X. C. Zhang

Author(s):  
Payam Mousavi ◽  
Ian R. Bushfield ◽  
Stéphane Savard ◽  
Frank Haran ◽  
J. Steven Dodge

2001 ◽  
pp. 315-328 ◽  
Author(s):  
P. Haring Bolivar ◽  
M. Brucherseifer ◽  
M. Nagel ◽  
H. P. M. Pellemans ◽  
H. Kurz

2002 ◽  
Vol 719 ◽  
Author(s):  
Saulius Marcinkevièius ◽  
Andreas Gaarder ◽  
Jörg Siegert ◽  
Jean-Fraņois Roux ◽  
Jean-Louis Coutaz ◽  
...  

AbstractA number of experimental techniques were used to characterize structural quality, ultrafast carrier dynamics and deep center properties of low-temperature-grown GaAs doped with Be. GaAs layers grown at 280 °C, doped with the Be concentration from 5×1017 cm-3 to 2×1019 cm-3 and annealed at temperatures between 500 and 800 °C were studied. Electron trapping times in these samples varied from hundreds of femtoseconds to several picoseconds. A non-monotonous electron trapping time dependence on Be doping level is explained by the influence of triple-charged gallium vacancies and single-charged Be-acceptors on the number of ionized As antisite defects.


1995 ◽  
Vol 378 ◽  
Author(s):  
P. M. Fauchet ◽  
G. W. Wicks ◽  
Y. Kostoulas ◽  
A. I. Lobad ◽  
K. B. Ucer

AbstractThe presence of point defects is expected to influence the properties of free carrier in semiconductors. We have used the techniques of ultrafast laser spectroscopy to characterize the dynamics of photoinjected carriers in several III–V semiconductors grown at low temperature. The initial scattering time and the lifetime of the carriers become very short at low growth temperatures. Results obtained with low-temperature grown III–Vs are compared to those obtained with III–Vs grown at normal temperatures and amorphous silicon.


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