Instabilities of Short-Pulse Laser Propagation through Plasma Channels

1994 ◽  
Vol 73 (26) ◽  
pp. 3540-3543 ◽  
Author(s):  
G. Shvets ◽  
J. S. Wurtele
Keyword(s):  
Pulse Laser ◽  
Short Pulse ◽  
Laser Propagation ◽  
Short Pulse Laser ◽  
Plasma Channels

Short-pulse laser propagation through tissues

2003 ◽  
Author(s):  
Champak Das ◽  
Ashish Trivedi ◽  
Kunal Mitra ◽  
Tuan Vo-Dinh
Keyword(s):  
Pulse Laser ◽  
Short Pulse ◽  
Laser Propagation ◽  
Short Pulse Laser

Short pulse laser propagation in underdense plasmas

1996 ◽  
Vol 53 (1) ◽  
pp. 1068-1083 ◽  
Author(s):  
M. D. Feit ◽  
J. C. Garrison ◽  
A. M. Rubenchik
Keyword(s):  
Pulse Laser ◽  
Short Pulse ◽  
Laser Propagation ◽  
Short Pulse Laser ◽  
Underdense Plasmas

Short pulse laser propagation through tissues for biomedical imaging

2003 ◽  
Vol 36 (14) ◽  
pp. 1714-1721 ◽  
Author(s):  
Champak Das ◽  
Ashish Trivedi ◽  
Kunal Mitra ◽  
Tuan Vo-Dinh
Keyword(s):  
Pulse Laser ◽  
Biomedical Imaging ◽  
Short Pulse ◽  
Laser Propagation ◽  
Short Pulse Laser

Silicon Thinning using Ultra-Short Pulse Laser Ablation

2004 ◽  
Author(s):  
F. Beaudoin ◽  
P. Perdu ◽  
C. DeNardi ◽  
R. Desplats ◽  
J. Lopez ◽  
...  
Keyword(s):  
Laser Ablation ◽  
Sample Preparation ◽  
Pulse Laser ◽  
Pulse Laser Ablation ◽  
Short Pulse ◽  
Special Care ◽  
Short Pulse Laser ◽  
Ultra Short Pulse ◽  
Ultra Short Pulse Laser

Abstract Ultra-short pulse laser ablation is applied to IC backside sample preparation. It is contact-less, non-thermal, precise and can ablate the various types of material present in IC packages. This study concerns the optimization of ultra-short pulse laser ablation for silicon thinning. Uncontrolled silicon roughness and poor uniformity of the laser thinned cavity needed to be tackled. Special care is taken to minimize the silicon RMS roughness to less than 1µm. Application to sample preparation of 256Mbit devices is presented.

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