Characterization of parasitic impedance in PCB using a flexible test probe based on a curve-fitting method

This paper presents the characterization of a microstrip-slot line in terms of its impedance and dimension. The characterization is made by referring to the analysis of different relative permittivity and thicknesses of substrates, which conducted by using CST Microwave Studio. Based on the characterization with the use of completing square curve fitting method, new formulated equations are proposed for microstrip-slot line. These formulated equations are suitable for thin substrate with low relative permittivity. The characterization is made based on the substrates with the selected thickness of 0.508 mm, 0.762 mm and 1.542 mm, for relative permittivity of 4.5 (TMM4), 3.38 (RO 4003C) and 2.94 (RT 6002).

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A Prony-based curve-fitting method for characterization of RF pulses from optoelectronic devices

IEEE Signal Processing Letters ◽

10.1109/lsp.2021.3135795 ◽

2021 ◽

pp. 1-1

Author(s):

Saptarshi Mukherjee ◽

Karen M Dowling ◽

Yicong Dong ◽

Kexin Li ◽

Adam Conway ◽

...

Keyword(s):

Curve Fitting ◽

Optoelectronic Devices ◽

Rf Pulses ◽

Fitting Method ◽

Curve Fitting Method

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Experimental characterization of a silicon photonic biosensor consisting of two cascaded ring resonators based on the Vernier-effect and introduction of a curve fitting method for an improved detection limit

Optics Express ◽

10.1364/oe.18.022747 ◽

2010 ◽

Vol 18 (22) ◽

pp. 22747 ◽

Cited By ~ 170

Author(s):

Tom Claes ◽

Wim Bogaerts ◽

Peter Bienstman

Keyword(s):

Detection Limit ◽

Curve Fitting ◽

Ring Resonators ◽

Experimental Characterization ◽

Fitting Method ◽

Silicon Photonic ◽

Vernier Effect ◽

Curve Fitting Method

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Using A Segmented Voltage Sweep Mode and A Gaussian Curve Fitting Method to Improve Heavy Metal Measurement System Performance

Metrology and Measurement Systems ◽

10.2478/v10178-012-0033-8 ◽

2012 ◽

Vol 19 (2) ◽

pp. 381-394

Author(s):

José Pereira ◽

Octavian Postolache ◽

Pedro Girão

Keyword(s):

Heavy Metals ◽

Heavy Metal ◽

Measurement System ◽

Curve Fitting ◽

System Performance ◽

Redox Potentials ◽

Voltage Sweep ◽

Gaussian Curve ◽

Fitting Method ◽

Curve Fitting Method

Using A Segmented Voltage Sweep Mode and A Gaussian Curve Fitting Method to Improve Heavy Metal Measurement System PerformanceThis paper presents a voltammetric segmented voltage sweep mode that can be used to identify and measure heavy metals' concentrations. The proposed sweep mode covers a set of voltage ranges that are centered around the redox potentials of the metals that are under analysis. The heavy metal measurement system can take advantage of the historical database of measurements to identify the metals with higher concentrations in a given geographical area, and perform a segmented sweep around predefined voltage ranges or, alternatively, the system can perform a fast linear voltage sweep to identify the voltammetric current peaks and then perform a segmented voltage sweep around the set of voltages that are associated with the voltammetric current peaks. The paper also includes the presentation of two auto-calibration modes that can be used to improve system's reliability and proposes the usage of a Gaussian curve fitting of voltammetric data to identify heavy metals and to evaluate their concentrations. Several simulation and experimental results, that validate the theoretical expectations, are also presented in the paper.

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