Computation and graphic visualization of plane-wave K-space spectra and far-field pattern with MATLAB 4.0

Author(s):  
R.A. Speciale
2020 ◽  
Vol 2 (12) ◽  
Author(s):  
M. Yousefi ◽  
D. Nečesal ◽  
T. Scharf ◽  
M. Rossi

Abstract We investigate the far-field pattern generation for a micro-lens array (MLA) illuminated under different conditions. Plane wave and Gaussian beam illumination are considered for an MLA with a small diameter of 27 microns and 30 microns period. At these dimensions, the optical effects are governed by diffraction and refraction and sometimes the regime is called the refraction limit. For Gaussian beam illumination, a high contrast dot pattern can be obtained in the far field according to the self-imaging theory for point source illumination and it is investigated in the simulation part. Also, we designed an interference microscopy setup to record both the phase and intensity in near field behind the MLA and also in the far field. The new instrument allows us to change illumination conditions from plane wave to point source. We then experimentally compare the near-field phase modulation and resulting far-field intensity for different conditions. For plane wave illumination, a high contrast pattern is observed in the far field. For the Gaussian beam illumination, the contrast of the far-field pattern depends on the distance of the source and MLA resulting in high contrast and a larger field of view only for particular distances depending on the interference of the Gaussian beam curved phase front and the MLA.


Author(s):  
David Colton

SynopsisLet D be a bounded simply connected domain in the plane and Ω the unit disk. Let F(Θ;k) be the far field pattern arising from the scattering of an incoming plane wave by the obstacle D and let an(k) denote the nth Fourier coefficient of F. Then if f conformally maps ℝ2\D onto ℝ2\Ω, a “moment” problem is derived which expresses an(k) in terms of f−1 for small values of the wave number k. The solution of this moment problem then gives the Laurent coefficients of f−1 and hence ∂D.


2008 ◽  
Vol 104 (12) ◽  
pp. 124513 ◽  
Author(s):  
P. Gellie ◽  
W. Maineult ◽  
A. Andronico ◽  
G. Leo ◽  
C. Sirtori ◽  
...  

1992 ◽  
Vol 70 (2-3) ◽  
pp. 173-178 ◽  
Author(s):  
Ioanna Diamandi ◽  
Costas Mertzianidis ◽  
John N. Sahalos

The far-field pattern characteristics of line sources lying between the slabs of a four-dielectric substrate configuration are presented. The patterns are calculated for several cases of the substrate thickness as well as for several line-source locations. The considerations that are made give useful applications in remote sensing and microstrip antennas.


2011 ◽  
Vol 19 (27) ◽  
pp. 26752 ◽  
Author(s):  
Alessio Benedetti ◽  
Marco Centini ◽  
Mario Bertolotti ◽  
Concita Sibilia

2012 ◽  
Vol 10 ◽  
pp. 69-73 ◽  
Author(s):  
K. A. Yinusa ◽  
C. H. Schmidt ◽  
T. F. Eibert

Abstract. Near-field measurements are established techniques to obtain the far-field radiation pattern of an Antenna Under Test via near-field measurements and subsequent near-field far-field transformation. For measurements acquired in echoic environments, additional post-processing is required to eliminate the effects of multipath signals in the resulting far-field pattern. One of such methods models the measurement environment as a multiple source scenario whereby the collected near-field data is attributed to the AUT and some scattering centers in the vicinity of the AUT. In this way, the contributions of the AUT at the probe can be separated from those of the disturbers during the near-field far-field transformation if the disturber locations are known. In this paper, we present ways of modeling the scattering centers on equivalent surfaces such that echo suppression is possible with only partial or no information about the geometry of the scatterers.


2021 ◽  
Author(s):  
◽  
Farzaneh Fadakar Masouleh

<p>Conventional optics suffer from a fundamental resolution limit due to the nature of light. The near-field superlens concept was introduced two decades ago, and its theory for enabling high resolution imaging is well-established now. Initially, this superlens, which has a simple setup, became a hot topic given the proposition of overcoming the diffraction limit. It has been demonstrated that a near-field superlens can reconstruct images using evanescent waves emanating from small objects by means of resonant excitations on the surface of the superlens. A modified version of the superlens named the far-field superlens is theorized to be able to project the near-field subwavelength information to the far-field region. By design, the far-field superlens is a near-field superlens with nanostructures added on top of it. These nanostructures, referred to as diffraction gratings help couple object information available in the evanescent waves to the far-field. Work reported in this thesis is divided to two major sections. The first describes the modelling technique that investigates the performance of a far-field superlens. This section focuses on evaluating the impact of the diffraction gratings geometry and the object size on the far-field superlens performance as well as the resulting far-field pattern. It was shown that a far-field superlens with a nanograting having a duty cycle of 40% to 50% produces the maximum intensity and contrast in the far-field interactions. For periodic rectangular objects, an inverse-trapezoidal nanograting was shown to provide the best contrast and intensity for far-field interactions. The minimal simulation domain to model a symmetric far-field superlens design was determined both in 2D and 3D. This input reduced the required modelling time and resources. Finally, a 3D far-field superlens model was proposed, and the effect of light polarization on the far-field pattern was studied. The second section of this thesis contains the experimental study that explores a new material as a potential candidate for the construction of far-field superlens. The material conventionally used for superlens design is silver, as its plasmonic properties are well-established. However, scaling down silver features to the nanoscale introduces fundamental fabrication challenges. Furthermore, silver oxidizes due to its reactions with sulphur compounds at ambient conditions, which means that operating a silver far-field superlens is only possible in a well-controlled environment. This disagrees with our proposed concept of a low-cost and robust superlens imaging device. On the other hand, highly doped semiconductors are emerging candidates for plasmonic applications due to the possibility of tuning their optical and electrical properties during the fabrication process. While the working principle of a superlens is independent of the plasmonic material of choice, every plasmonic material has a particular range of operating wavelengths. The pros and cons of each plasmonic material are usually identified once used experimentally. In this work, aluminium-doped zinc oxide was the proposed material of choice for the far-field superlens design. The second part of this thesis details the characterization results of the optical, electrical and structural properties of this proposed alternative. Our aluminium-doped zinc oxide samples were highly transparent for large parts of the spectrum. Their carrier concentration was of the order of 10+20 cm-3, and a resistivity of about 10-3 Ω.cm was achieved. The modelled dielectric permittivity for the studied samples showed a cross-over frequency in the near-infrared region, with the highest plasma frequency achieved in this study being 4710 cm-1.</p>


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