Electrical Variable Capacitor of Reduced Switch Count and Voltage Stress for 13.56MHz RF Plasma System

Author(s):  
Juhwa Min ◽  
Yongsug Suh
2020 ◽  
Vol 20 (6) ◽  
pp. 1562-1572
Author(s):  
Juhwa Min ◽  
Beomseok Chae ◽  
Yongsug Suh ◽  
Jinho Kim ◽  
Hyunbae Kim

2015 ◽  
Vol 9 (7) ◽  
pp. 80 ◽  
Author(s):  
Reni Desmiarti ◽  
Ariadi Hazmi ◽  
Yenni Trianda

A radio-frequency plasma system (RF) was used to investigate the removal of microorganisms from water.Plasma generated by RF radiation can produce active compounds (H•, •OH, H2O2, O3, etc.) that have a highoxidation potential and can kill microorganisms present in water (fecal coliforms and total coliforms). Thefrequency of the plasma system was set to 3.0, 3.3 and 3.7 MHz and applied to river water for 60 minutes. Theresults show that in all runs, the pH of the water produced was in the range from 7.4 to 7.9. The removalefficiencies of fecal coliforms achieved were between 83.75 and 95% and were higher than the removalefficiencies of total coliforms, which were between 82.61 and 93.48%. Meanwhile, the death rate (kD) of fecalcoliforms wasfaster than that of total coliforms. Therefore, the removal of total coliforms is the key to removingmicroorganisms fromwater. RF plasma treatment can be used for treatment of drinking water to decreasemicroorganisms.


2004 ◽  
Author(s):  
Ernesto Vargas Lopez ◽  
Brian E. Jurczyk ◽  
Michael A. Jaworski ◽  
Martin J. Neumann ◽  
David N. Ruzic
Keyword(s):  

1995 ◽  
Vol 48 (3) ◽  
pp. 439
Author(s):  
Y Hosokauia ◽  
T Kitajima ◽  
T Makabe

The work is focused on the growth and transport of submicron particles in nonreactive radiofrequency plasma in Ar at 13�56 MHz, studied by numerical modeling using the relaxation continuum model, and by experiment using spatiotemporally resolved optical emission spectroscopy with Mie scattering. The particle growth/decay under conditions of the initially injected (CF2)n, and the related spatiotemporal change of the rf plasma structure, are discussed in terms of their numerical and experimental results. The results give suggestions with respect to the influence of particles in a dusty rf plasma system, such as dry etching and sputtering.


2016 ◽  
Vol 42 (3) ◽  
pp. 290-292 ◽  
Author(s):  
A. F. Aleksandrov ◽  
A. K. Petrov ◽  
K. V. Vavilin ◽  
E. A. Kralkina ◽  
P. A. Neklyudova ◽  
...  

2004 ◽  
Vol 265 (1-2) ◽  
pp. 149-153 ◽  
Author(s):  
T. Sato ◽  
H. Suzuki ◽  
O. Kido ◽  
M. Kurumada ◽  
K. Kamitsuji ◽  
...  

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