Novel method of doping tungsten into zinc oxide ultrafine particle using RF plasma system

2004 ◽  
Vol 265 (1-2) ◽  
pp. 149-153 ◽  
Author(s):  
T. Sato ◽  
H. Suzuki ◽  
O. Kido ◽  
M. Kurumada ◽  
K. Kamitsuji ◽  
...  
Keyword(s):  
Zinc Oxide ◽  
Ultrafine Particle ◽  
Rf Plasma ◽  
Plasma System ◽  
Novel Method

scholarly journals Fecal Coliforms and Total Coliforms Removal in Water Using Radio-Frequency (RF) Plasma System

2015 ◽  
Vol 9 (7) ◽  
pp. 80 ◽  
Author(s):  
Reni Desmiarti ◽  
Ariadi Hazmi ◽  
Yenni Trianda
Keyword(s):  
Drinking Water ◽  
Radio Frequency ◽  
Plasma Treatment ◽  
Death Rate ◽  
Fecal Coliforms ◽  
Rf Plasma ◽  
Radio Frequency Plasma ◽  
Plasma System ◽  
Total Coliforms ◽  
Frequency Plasma

A radio-frequency plasma system (RF) was used to investigate the removal of microorganisms from water.Plasma generated by RF radiation can produce active compounds (H•, •OH, H2O2, O3, etc.) that have a highoxidation potential and can kill microorganisms present in water (fecal coliforms and total coliforms). Thefrequency of the plasma system was set to 3.0, 3.3 and 3.7 MHz and applied to river water for 60 minutes. Theresults show that in all runs, the pH of the water produced was in the range from 7.4 to 7.9. The removalefficiencies of fecal coliforms achieved were between 83.75 and 95% and were higher than the removalefficiencies of total coliforms, which were between 82.61 and 93.48%. Meanwhile, the death rate (kD) of fecalcoliforms wasfaster than that of total coliforms. Therefore, the removal of total coliforms is the key to removingmicroorganisms fromwater. RF plasma treatment can be used for treatment of drinking water to decreasemicroorganisms.

Origins of debris and mitigation through a secondary RF plasma system for discharge-produced EUV sources

2004 ◽  
Author(s):  
Ernesto Vargas Lopez ◽  
Brian E. Jurczyk ◽  
Michael A. Jaworski ◽  
Martin J. Neumann ◽  
David N. Ruzic
Keyword(s):  
Rf Plasma ◽  
Plasma System

A Novel Method for the Preparation of Green-photoluminescent Zinc Oxide by Microwave-assisted Carbothermal Reduction

2004 ◽  
Vol 33 (3) ◽  
pp. 246-247 ◽  
Author(s):  
Tetsushi Yamamoto ◽  
Yuji Wada ◽  
Hiromitsu Miyamoto ◽  
Shozo Yanagida
Keyword(s):  
Zinc Oxide ◽  
Carbothermal Reduction ◽  
Microwave Assisted ◽  
Novel Method

scholarly journals Modeling and Measurement of Submicron Particles in RF Plasmas in Ar

1995 ◽  
Vol 48 (3) ◽  
pp. 439
Author(s):  
Y Hosokauia ◽  
T Kitajima ◽  
T Makabe
Keyword(s):  
Emission Spectroscopy ◽  
Continuum Model ◽  
Optical Emission Spectroscopy ◽  
Optical Emission ◽  
Particle Growth ◽  
Mie Scattering ◽  
Submicron Particles ◽  
Rf Plasma ◽  
Plasma System ◽  
Rf Plasmas

The work is focused on the growth and transport of submicron particles in nonreactive radiofrequency plasma in Ar at 13�56 MHz, studied by numerical modeling using the relaxation continuum model, and by experiment using spatiotemporally resolved optical emission spectroscopy with Mie scattering. The particle growth/decay under conditions of the initially injected (CF2)n, and the related spatiotemporal change of the rf plasma structure, are discussed in terms of their numerical and experimental results. The results give suggestions with respect to the influence of particles in a dusty rf plasma system, such as dry etching and sputtering.

scholarly journals Highly Conductive Zinc Oxide Based Transparent Conductive Oxide Films Prepared Using RF Plasma Sputtering Under Reducing Atmosphere

Coatings ◽  
2020 ◽  
Vol 10 (5) ◽  
pp. 472
Author(s):  
Ali Salimian ◽  
Abul Hasnath ◽  
Lorna Anguilano ◽  
Uchechukwu Onwukwe ◽  
Arjang Aminishahsavarani ◽  
...  
Keyword(s):  
Thin Films ◽  
Zinc Oxide ◽  
Emission Spectra ◽  
Transparent Conductive Oxide ◽  
Plasma Source ◽  
Deposition Process ◽  
Hydrogen Gas ◽  
Rf Plasma ◽  
Monitoring Method ◽  
Plasma Sputtering

The spectral properties and colour functions of a radio frequency (RF)-based sputtering plasma source was monitored during consecutive sputter deposition of zinc doped indium oxide (IZO) thin films under argon and argon/hydrogen mix. The effect of target exposure to the hydrogen gas on charge density/mobility and spectral transmittance of the deposited films was investigated. We demonstrate that consecutive exposure to the hydrogen gas during the deposition process progressively affects the properties of thin films with a certain degree of continuous improvement in electrical conductivity while demonstrating that reverting to only argon from argon/ hydrogen mix follows a complex pathway, which has not been reported previously in such detail to our knowledge. We then demonstrate that this effect can be used to prepare highly conductive zinc oxide thin films without indium presence and as such eliminating the need for the expensive indium addition. We shall demonstrate that complexity observed in emission spectra can be simply identified by monitoring the colour of the plasma through its colour functions, making this technique a simple real-time monitoring method for the deposition process.

Investigation of the helicon discharge plasma parameters in a hybrid RF plasma system

2016 ◽  
Vol 42 (3) ◽  
pp. 290-292 ◽  
Author(s):  
A. F. Aleksandrov ◽  
A. K. Petrov ◽  
K. V. Vavilin ◽  
E. A. Kralkina ◽  
P. A. Neklyudova ◽  
...  
Keyword(s):  
Discharge Plasma ◽  
Rf Plasma ◽  
Plasma Parameters ◽  
Plasma System
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