Photocatalytic removal of phenol under visible light irradiation on zinc phthhalocyanine/mesoporous carbon nitride

Author(s):  
Shu Chin Lee ◽  
Hendrik O. Lintang ◽  
Leny Yuliati
2014 ◽  
Vol 925 ◽  
pp. 130-134 ◽  
Author(s):  
Shu Chin Lee ◽  
Hendrik O. Lintang ◽  
Salasiah Endud ◽  
Leny Yuliati

In this work, we reported the photocatalytic activities of carbon nitride (CN) materials for removal of various aromatic organic pollutants under visible light irradiation. Both bulk carbon nitride (BCN) and mesoporous carbon nitride (MCN) were prepared similarly through thermal polymerization of urea precursor, except that the mesoporous structure was generated onto the MCN via hard template approach using silica nanoparticles. Successful preparations of both BCN and MCN were suggested from various characterization techniques using XRD, DR UV-Visible spectroscopy, nitrogen adsorption-desorption analyzer, and TEM. The prepared BCN and MCN were tested for removal of aromatic organic pollutants, which were benzene, phenol and salicylic acid under visible light irradiation. Both BCN and MCN did not exhibit any photocatalytic activities in the removal of benzene, but active for removals of phenol and salicylic acid. The structure stability and the presence of electron donating group on the organic pollutants were proposed to affect the photocatalytic removal reactions. Owing to the larger BET specific surface area, MCN showed much higher photocatalytic activity than the BCN for removal of phenol and salicylic acid.


Author(s):  
Shu Chin Lee ◽  
Wee Shern Chew ◽  
Hendrik O. Lintang ◽  
Leny Yuliati

Carbon nitride is a material of interest for photocatalytic reactions due to its catalytic and visible light absorption properties. However, the photocatalytic activity is still low. Hence, modifications must be carried out to improve the photocatalytic activity of carbon nitride. In this work, a series of gallium oxide/carbon nitride composites with various gallium to carbon ratios (Ga/C = 1-50 mol%) was prepared by impregnation method for removal of cyclohexane under visible light irradiation for the first time. The successful preparation of gallium oxide/carbon nitride composites was supported by several characterization techniques. X-ray diffraction (XRD) patterns and diffuse reflectance UV-visible (DR UV-vis) spectra revealed that the increased Ga/C ratio resulted in the increased formation of Ga2O3. Furthermore, all the prepared composite samples also showed visible light absorption up to about 430 nm. In the photocatalytic removal of cyclohexane under 6 h of visible light irradiation, sample with low loading of 1 mol% Ga/C improved the photocatalytic activity of carbon nitride for two times. The high activity obtained on the gallium oxide (1 mol%)/carbon nitride composite clearly suggested the presence of synergic effect between small amount of gallium oxide and carbon nitride when they were combined. This study showed that a visible light-driven gallium oxide/carbon nitride composite could be prepared by impregnating a small amount of gallium oxide on carbon nitride and the composite is a potential photocatalyst for removal of cyclohexane under visible light irradiation.  


RSC Advances ◽  
2021 ◽  
Vol 11 (11) ◽  
pp. 6383-6394 ◽  
Author(s):  
Haishuai Li ◽  
Linlin Cai ◽  
Xin Wang ◽  
Huixian Shi

A noval ternary nanocomposite AgCl/Ag3PO4/g-C3N4 was successfully synthesized for photocatalytic degradation of methylene blue, methylparaben and inactivation of E. coli under visible light irradiation, showing excellent photocatalytic degradation performance and stability.


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