Abstract
Developing semiconducting solution-processed ultra-wide bandgap (UWB) amorphous oxide semiconductor (AOS) is an emerging area of research interest. However, obtaining electrical conduction on it is quite challenging. Here, we demonstrate the insulator-to-semiconductor conversion of solution-processed a-Ga2Ox (Eg~4.8 eV) through hydrogen annealing. The successful conversion was reflected by the switching thin-film transistor (TFT) with μsat of 10-2 cm2/Vs. We showed that H incorporated after hydrogen annealing acts as a shallow donor which increased the carrier concentration and shifted the EF closer to the CBM.