Materials properties of B-doped Si by low energy plasma source ion implantation

2002 ◽  
Author(s):  
R.J. Matyi ◽  
D.P. Brunco ◽  
S.B. Felch ◽  
E. Ishida ◽  
L. Larson ◽  
...  
Keyword(s):  
Ion Implantation ◽  
Plasma Source ◽  
Low Energy ◽  
Materials Properties ◽  
Plasma Source Ion Implantation

Plasma Source Ion Implantation for Ultrashallow Junctions: Low Energy and High Dose Rate

2001 ◽  
Vol 40 (Part 1, No. 4A) ◽  
pp. 2506-2507
Author(s):  
Jeonghee Cho ◽  
Seunghee Han ◽  
Yeonhee Lee ◽  
Ok Kyung Kim ◽  
Gon-Ho Kim ◽  
...  
Keyword(s):  
Ion Implantation ◽  
Dose Rate ◽  
Plasma Source ◽  
High Dose Rate ◽  
Low Energy ◽  
High Dose ◽  
Ultrashallow Junctions ◽  
Plasma Source Ion Implantation

scholarly journals Low‐energy separation by implantation of oxygen structures via plasma source ion implantation

1994 ◽  
Vol 65 (8) ◽  
pp. 962-964 ◽  
Author(s):  
L. Zhang ◽  
J. L. Shohet ◽  
D. Dallmann ◽  
J. H. Booske ◽  
R. R. Speth ◽  
...  
Keyword(s):  
Ion Implantation ◽  
Plasma Source ◽  
Low Energy ◽  
Energy Separation ◽  
Plasma Source Ion Implantation

Recent results in plasma source ion implantation

1992 ◽  
Author(s):  
JOHN CONRAD ◽  
M. ABUZRIBA ◽  
J. BLANCHARD ◽  
D. CHAPEK ◽  
A. CHEN ◽  
...  
Keyword(s):  
Ion Implantation ◽  
Plasma Source ◽  
Plasma Source Ion Implantation

Boron doping of silicon by plasma source ion implantation

1997 ◽  
Vol 93 (2-3) ◽  
pp. 247-253 ◽  
Author(s):  
R.J. Matyi ◽  
D.L. Chapek ◽  
D.P. Brunco ◽  
S.B. Felch ◽  
B.S. Lee
Keyword(s):  
Ion Implantation ◽  
Boron Doping ◽  
Plasma Source ◽  
Plasma Source Ion Implantation

scholarly journals Distribution of incident ions and retained dose analysis for a wedge‐shaped target in plasma source ion implantation

1995 ◽  
Vol 77 (3) ◽  
pp. 1015-1019 ◽  
Author(s):  
Shamim M. Malik ◽  
D. E. Muller ◽  
K. Sridharan ◽  
R. P. Fetherston ◽  
Ngoc Tran ◽  
...  
Keyword(s):  
Ion Implantation ◽  
Plasma Source ◽  
Plasma Source Ion Implantation
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