Abstract
A comparative study of the effect of co-sputtering specifically magnetron sputtering process input factors on surface roughness of W and Al2O3 thin film developed on the SS304 and Copper(Cu) substrates in the argon atmosphere. The input parameters have been varied based on the Design of Experiments specifically Center Composite Design experimental plan. Atomic Force microscope has been used to determine the average surface roughness in nanometer of all the samples as per experimental combinations. By using ANOVA method, the effect of factors on roughness and regression model have been developed, which express degree to input parameter can effect on the surface roughness. Analysis of surface roughness of W and Al2O3 thin film developed above said different substrates have been presented.
Comparative Study of Surface Roughness of Tungsten and Alumina co-sputtered on Stainless Steel and Copper substrates
