Solid state class DE RF power source

Author(s):  
I.D. de Vries ◽  
J.H. van Nierop ◽  
J.R. Greene
Keyword(s):  
2010 ◽  
Vol 22 (7) ◽  
pp. 1682-1686
Author(s):  
金晖 Jin Hui ◽  
金晓 Jin Xiao ◽  
罗光耀 Luo Guangyao

1975 ◽  
Vol 30 (12) ◽  
pp. 1600-1605 ◽  
Author(s):  
H. Schlüter ◽  
G. Schürger

Abstract A theoretical study is carried out for the resistive loading of an rf power source inductively coupled to a plasma cylinder which is immersed in a magnetic field. The plasma is assumed to consist of electrons, two ion and two neutral species. The results are compared with measurements in a hydrogen plasma.


Author(s):  
Gabriele Formicone ◽  
Jeff Burger ◽  
James Custer ◽  
Gianni Bosi ◽  
Antonio Raffo ◽  
...  

Author(s):  
C.D. Davis ◽  
M.T. Lynch ◽  
D.W. Reid
Keyword(s):  

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