A Numerical Study of an Amorphous Silicon Dual-Gate Photo Thin-Film Transistor for Low-Dose X-Ray Imaging

2015 ◽  
Vol 11 (8) ◽  
pp. 646-651 ◽  
Author(s):  
Luting Wang ◽  
Hai Ou ◽  
Jun Chen ◽  
Kai Wang
2016 ◽  
Vol 28 (18) ◽  
pp. 1952-1955 ◽  
Author(s):  
Xinghui Liu ◽  
Hai Ou ◽  
Jun Chen ◽  
Shaozhi Deng ◽  
Ningsheng Xu ◽  
...  
Keyword(s):  
Low Dose ◽  
X Ray ◽  

2020 ◽  
Vol 38 (14) ◽  
pp. 3775-3780 ◽  
Author(s):  
Yangbing Xu ◽  
Qi Zhou ◽  
Jia Huang ◽  
Weiwei Li ◽  
Jun Chen ◽  
...  

2017 ◽  
Vol 64 (12) ◽  
pp. 4952-4958 ◽  
Author(s):  
Kai Wang ◽  
Hai Ou ◽  
Jun Chen ◽  
Arokia Nathan ◽  
Shaozhi Deng ◽  
...  

1997 ◽  
Vol 467 ◽  
Author(s):  
M J Powell ◽  
C Glasse ◽  
I D French ◽  
A R Franklin ◽  
J R Hughes ◽  
...  

ABSTRACTWe have developed a new amorphous silicon image sensor technology using a matrix array of amorphous silicon thin film transistors and photodiodes, where the amorphous silicon nip photodiode is fabricated on top of a thick insulating layer, on top of the thin film transistor array. We call this ‘diode on top’ technology or DOTTY. The active diode area can be as high as 93%, compared to 50% for our conventional photodiode-TFT technology. This leads to a higher signal to noise performance, which is important for medical X-ray applications.


Sign in / Sign up

Export Citation Format

Share Document