Optical fiber dispersion measurement technique using a streak camera

1987 ◽  
Vol 5 (1) ◽  
pp. 119-124 ◽  
Author(s):  
K. Mochizuki ◽  
M. Fujise ◽  
M. Kuwazuru ◽  
M. Nunokawa ◽  
Y. Iwamoto
2012 ◽  
Vol 51 (27) ◽  
pp. 6586 ◽  
Author(s):  
Tatsutoshi Shioda ◽  
Naoya Shimizu ◽  
Masaichi Nakamura

1991 ◽  
Vol 224 ◽  
Author(s):  
C. Schietinger ◽  
B. Adams ◽  
C. Yarling

AbstractA novel wafer temperature and emissivity measurement technique for rapid thermal processing (RTP) is presented. The ‘Ripple Technique’ takes advantage of heating lamp AC ripple as the signature of the reflected component of the radiation from the wafer surface. This application of Optical Fiber Thermometry (OFT) allows high speed measurement of wafer surface temperatures and emissivities. This ‘Ripple Technique’ is discussed in theoretical and practical terms with wafer data presented. Results of both temperature and emissivity measurements are presented for RTP conditions with bare silicon wafers and filmed wafers.


2018 ◽  
Vol 47 (8) ◽  
pp. 806002
Author(s):  
王旭 WANG Xu ◽  
张玲娟 ZHANG Ling-juan ◽  
陈龙飞 CHEN Long-fei ◽  
李小康 LI Xiao-kang ◽  
王芳 WANG Fang ◽  
...  

2015 ◽  
Vol 58 (1) ◽  
pp. 242-245 ◽  
Author(s):  
Yingting Ge ◽  
Qianying Guo ◽  
Jiaojiao Shi ◽  
Xutao Chen ◽  
Yunsheng Bai ◽  
...  

2008 ◽  
Vol 2008.8 (0) ◽  
pp. 89-90
Author(s):  
Yusuke OZAWA ◽  
Keisuke MATSUDA ◽  
Shingo OISHI ◽  
Shin-ichiro AOSHIMA ◽  
Toshiyuki SANADA ◽  
...  

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