An improved compact model of the electrical behaviour of the 5-contact vertical hall-effect device

Author(s):  
Morgan Madec ◽  
Jean-Baptiste Schell ◽  
Jean-Baptiste Kammerer ◽  
Christophe Lallement ◽  
Luc Hebrard
2014 ◽  
Vol 81 (3) ◽  
pp. 677-691 ◽  
Author(s):  
Morgan Madec ◽  
Jean-Baptiste Schell ◽  
Jean-Baptiste Kammerer ◽  
Christophe Lallement ◽  
Luc Hébrard

1987 ◽  
Vol 92 ◽  
Author(s):  
Nicole DUIIAMEL ◽  
Brigitte DESCOUTS ◽  
Philippe KRAUZ ◽  
Krishna RAO ◽  
Jean DANGLA ◽  
...  

ABSTRACTRapid thermal anneal (R.T.A.) by halogen lamps has been carried out to activate Si29 implants in semi-insulating InP substrates with the aim of realizing good contact areas at low depth (0.1 μm). To better understand the electrical behaviour of Si observed in these conditions, and to try to increase the electrical activity we performed dual implantations (As + Si or P + Si). The crystallographic disorder remaining after anneal and its influence on the electrical properties are discussed. The uniformity of activation has been evaluated by Hall effect and specific contact resistivity cartographies both for mono-implantations and for dual implantations.


2012 ◽  
Vol 73 (3) ◽  
pp. 719-730 ◽  
Author(s):  
Morgan Madec ◽  
Jean-Baptiste Kammerer ◽  
Luc Hébrard ◽  
Christophe Lallement

2011 ◽  
Vol 171 (2) ◽  
pp. 69-78 ◽  
Author(s):  
M. Madec ◽  
J.B. Kammerer ◽  
L. Hébrard ◽  
C. Lallement

1980 ◽  
Vol 41 (C8) ◽  
pp. C8-467-C8-469 ◽  
Author(s):  
R. Asomoza ◽  
J. B. Bieri ◽  
A. Fert ◽  
B. Boucher ◽  
J. C. Ousset

2015 ◽  
Vol 185 (5) ◽  
pp. 479-488 ◽  
Author(s):  
Aleksandr F. Barabanov ◽  
Yurii M. Kagan ◽  
Leonid A. Maksimov ◽  
Andrey V. Mikheyenkov ◽  
Tatyana V. Khabarova
Keyword(s):  

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