GaN-Based Enhancement-Mode Metal–Oxide–Semiconductor High-Electron Mobility Transistors Using LiNbO3 Ferroelectric Insulator on Gate-Recessed Structure

2015 ◽  
Vol 62 (8) ◽  
pp. 2481-2487 ◽  
Author(s):  
Ching-Ting Lee ◽  
Chang-Lin Yang ◽  
Chun-Yen Tseng ◽  
Jhe-Hao Chang ◽  
Ray-Hua Horng
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