Low temperature plasma amorphous carbon encapsulation for reliable multilevel interconnections-with applications to wafer scale multichip packaging

Author(s):  
J.F. McDonald ◽  
S. Dabral ◽  
S.M. Wu ◽  
A. Martin ◽  
T.M. Lu
Materials ◽  
2021 ◽  
Vol 14 (17) ◽  
pp. 4842
Author(s):  
Justyna Witkowska ◽  
Michał Tarnowski ◽  
Emilia Choińska ◽  
Marek Kulpa ◽  
Jacek Szade ◽  
...  

Our previous work has shown that for cardiac applications, combining low-temperature plasma oxidation with an amorphous carbon coating (a-C:N:H type) constitutes a prospective solution. In this study, a short-term modification by low-temperature oxygen plasma is proposed as an example and a method for shaping the topography and surface energy of the outer amorphous carbon coating, produced via the Radio-Frequency Chemical Vapour Deposition (RFCVD) method on NiTi alloy oxidized under glow-discharge conditions. This treatment alters the chemical composition of the outer zone of the surface layer. A slight increase is also noted in the surface roughness at the nanoscale. The contact angles were shown to increase by about 20% for water and 30% for diiodomethane, while the surface free energy decreased by ca. 11%. The obtained results indicate that even short-term contact with low-temperature plasma can shape the surface properties of the carbon coating, an outcome which shows potential in terms of its use in medical applications.


2019 ◽  
Vol 23 (3) ◽  
pp. 746-754
Author(s):  
Dinar Dilshatovich Fazullin ◽  
Gennady Vitalievich Mavrin ◽  
Vladislav Olegovich Dryakhlov ◽  
Ildar Gilmanovich Shaikhiev ◽  
Irek Rashatovich Nizameyev

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