LOW TEMPERATURE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION OF CARBON FILMS ON DIFFERENT SUBSTRATES

2006 ◽  
Vol 10 (3) ◽  
pp. 457-466
Author(s):  
A. Ya. Vinogradov ◽  
A. N. Andronov ◽  
A. B Ustinov ◽  
K. E. Orlov ◽  
A. S. Smirnov
Keyword(s):  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Carbon Films ◽  
Low Temperature Plasma ◽  
Temperature Plasma

Low-temperature plasma-enhanced chemical vapor deposition of hard carbon films

Vacuum ◽  
2004 ◽  
Vol 73 (1) ◽  
pp. 131-135 ◽  
Author(s):  
A.Ya. Vinogradov ◽  
A.S. Abramov ◽  
K.E. Orlov ◽  
A.S. Smirnov
Keyword(s):  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Carbon Films ◽  
Low Temperature Plasma ◽  
Hard Carbon ◽  
Temperature Plasma

Low-Temperature Plasma-Enahanced Chemical Vapor Deposition of Crystal Silicon Film from Dichlorosilane

2001 ◽  
Vol 40 (Part 1, No. 1) ◽  
pp. 44-48 ◽  
Author(s):  
Haiping Liu ◽  
Sughoan Jung ◽  
Yukihiro Fujimura ◽  
Chisato Fukai ◽  
Hajime Shirai ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Vapor Deposition ◽  
Silicon Film ◽  
Chemical Vapor ◽  
Low Temperature Plasma ◽  
Crystal Silicon ◽  
Temperature Plasma

Low‐temperature plasma enhanced chemical vapor deposition of SiO2

1994 ◽  
Vol 65 (25) ◽  
pp. 3185-3187 ◽  
Author(s):  
Shashank C. Deshmukh ◽  
Eray S. Aydil
Keyword(s):  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low Temperature Plasma ◽  
Temperature Plasma
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