Scaled measurements of global space-charge induced image blur in electron beam projection system

2000 ◽  
Vol 18 (6) ◽  
pp. 2999 ◽  
Author(s):  
Liqun Han ◽  
R. Fabian Pease ◽  
W. Dan Meisburger ◽  
Gil I. Winograd ◽  
Kimitoshi Takahashi
Keyword(s):  
Electron Beam ◽  
Space Charge ◽  
Projection System ◽  
Global Space ◽  
Image Blur ◽  
Beam Projection

Simulation of space charge neutralization using ions in electron beam projection optics

2001 ◽  
Vol 57-58 ◽  
pp. 231-238 ◽  
Author(s):  
Kimitoshi Takahashi ◽  
Liqun Han ◽  
R.Fabian Pease ◽  
W.Dan Meisburger
Keyword(s):  
Electron Beam ◽  
Space Charge ◽  
Charge Neutralization ◽  
Beam Projection ◽  
Projection Optics

Stencil reticle development for electron beam projection system

1999 ◽  
Vol 17 (6) ◽  
pp. 2864 ◽  
Author(s):  
S. Kawata ◽  
N. Katakura ◽  
S. Takahashi ◽  
K. Uchikawa
Keyword(s):  
Electron Beam ◽  
Projection System ◽  
Beam Projection

Global space charge effects in high-throughput electron-beam lithography

1999 ◽  
Author(s):  
Liqun Han ◽  
W. D. Meisburger ◽  
Roger Fabian W. Pease ◽  
Gil I. Winograd
Keyword(s):  
Electron Beam ◽  
Space Charge ◽  
High Throughput ◽  
Electron Beam Lithography ◽  
Space Charge Effects ◽  
Charge Effects ◽  
Global Space

Development of data conversion system for electron beam projection lithography

2002 ◽  
Vol 20 (6) ◽  
pp. 2672 ◽  
Author(s):  
Kokoro Kato ◽  
Kuninori Nishizawa ◽  
Tamae Haruki ◽  
Tadao Inoue ◽  
Koichi Kamijo ◽  
...  
Keyword(s):  
Electron Beam ◽  
Data Conversion ◽  
Projection Lithography ◽  
Conversion System ◽  
Beam Projection
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