Development of data conversion system for electron beam projection lithography

2002 ◽  
Vol 20 (6) ◽  
pp. 2672 ◽  
Author(s):  
Kokoro Kato ◽  
Kuninori Nishizawa ◽  
Tamae Haruki ◽  
Tadao Inoue ◽  
Koichi Kamijo ◽  
...  
Keyword(s):  
Electron Beam ◽  
Data Conversion ◽  
Projection Lithography ◽  
Conversion System ◽  
Beam Projection

Development of data conversion system for electron-beam projection lithography (EPL) mask

2001 ◽  
Author(s):  
Yasuhisa Yamada ◽  
Hideo Kobinata ◽  
Takao Tamura ◽  
Mami Miyasaka ◽  
Tatsuya Sakamoto ◽  
...  
Keyword(s):  
Electron Beam ◽  
Data Conversion ◽  
Projection Lithography ◽  
Conversion System ◽  
Beam Projection

High-Speed Proximity Effect Correction System for Electron-Beam Projection Lithography by Cluster Processing

2003 ◽  
Vol 42 (Part 1, No. 6B) ◽  
pp. 3827-3832 ◽  
Author(s):  
Kozo Ogino ◽  
Hiromi Hoshino ◽  
Yasuhide Machida ◽  
Morimi Osawa ◽  
Hiroshi Arimoto ◽  
...  
Keyword(s):  
Electron Beam ◽  
Proximity Effect ◽  
High Speed ◽  
Projection Lithography ◽  
Beam Projection ◽  
Proximity Effect Correction ◽  
Correction System

High-Speed Electron Beam Data Conversion System Combining Hierarchical Operation with Parallel Processing

1992 ◽  
Vol 31 (Part 1, No. 12B) ◽  
pp. 4257-4261
Author(s):  
Shunko Magoshi ◽  
Kiyomi Koyama ◽  
Osamu Ikenaga ◽  
Susumu Watanabe ◽  
Tamaki Saito ◽  
...  
Keyword(s):  
Electron Beam ◽  
Parallel Processing ◽  
High Speed ◽  
Data Conversion ◽  
Conversion System

Stencil Mask Technology for Electron-Beam Projection Lithography

2003 ◽  
Vol 42 (Part 1, No. 6B) ◽  
pp. 3811-3815 ◽  
Author(s):  
Isao Amemiya ◽  
Hiroshi Yamashita ◽  
Sakae Nakatsuka ◽  
Tadashi Sakurai ◽  
Ikuru Kimura ◽  
...  
Keyword(s):  
Electron Beam ◽  
Projection Lithography ◽  
Stencil Mask ◽  
Beam Projection

Stitching accuracy measurement system for EB direct writing and electron-beam projection lithography (EPL)

2001 ◽  
Author(s):  
Takao Tamura ◽  
Takahiro Ema ◽  
Hiroshi Nozue ◽  
Tamoya Sugahara ◽  
Akio Sugano ◽  
...  
Keyword(s):  
Electron Beam ◽  
Measurement System ◽  
Direct Writing ◽  
Accuracy Measurement ◽  
Projection Lithography ◽  
Beam Projection

Optimization of PHS-based chemically amplified negative resist for 100-kV electron-beam projection lithography (EPL)

2000 ◽  
Author(s):  
Mami Miyasaka ◽  
Kenichi Tokunaga ◽  
Fumihiro Koba ◽  
Hiroshi Yamashita ◽  
Ken Nakajima ◽  
...  
Keyword(s):  
Electron Beam ◽  
Projection Lithography ◽  
Chemically Amplified ◽  
Beam Projection
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