Negative electron-beam resist hard mask ion beam etching process for the fabrication of nanoscale magnetic tunnel junctions

2012 ◽  
Vol 30 (6) ◽  
pp. 06FA01 ◽  
Author(s):  
Sung-Woo Chun ◽  
Daehong Kim ◽  
Jihun Kwon ◽  
Bongho Kim ◽  
Hyungyu Lee ◽  
...  
Keyword(s):  
Electron Beam ◽  
Tunnel Junctions ◽  
Ion Beam ◽  
Magnetic Tunnel Junctions ◽  
Etching Process ◽  
Ion Beam Etching ◽  
Hard Mask

Multi-step ion beam etching of sub-30 nm magnetic tunnel junctions for reducing leakage and MgO barrier damage

2012 ◽  
Vol 111 (7) ◽  
pp. 07C722 ◽  
Author(s):  
Sung-woo Chun ◽  
Daehong Kim ◽  
Jihun Kwon ◽  
Bongho Kim ◽  
Seonjun Choi ◽  
...  
Keyword(s):  
Tunnel Junctions ◽  
Ion Beam ◽  
Magnetic Tunnel Junctions ◽  
Ion Beam Etching

scholarly journals Transmission Electron Microscopy Study on the Crystallization of Ion Beam Assisted Deposited CoFeB/MgO/CoFeB Magnetic Tunnel Junctions with Tantalum Capping Layer

2011 ◽  
Vol 17 (S2) ◽  
pp. 1860-1861
Author(s):  
R Petrova ◽  
R Ferreira ◽  
S Cardoso ◽  
P Freitas ◽  
S McVitie ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
Tunnel Junctions ◽  
Ion Beam ◽  
Magnetic Tunnel Junctions ◽  
Microscopy Study ◽  
Electron Microscopy Study ◽  
Transmission Electron Microscopy Study ◽  
Capping Layer ◽  
Transmission Electron

Extended abstract of a paper presented at Microscopy and Microanalysis 2011 in Nashville, Tennessee, USA, August 7–August 11, 2011.

Effect of Ar ion beam channeling on AlGaN/GaN heterostructures during the ion beam etching process

2000 ◽  
Vol 76 (14) ◽  
pp. 1899-1901 ◽  
Author(s):  
O. Breitschädel ◽  
J. T. Hsieh ◽  
B. Kuhn ◽  
F. Scholz ◽  
H. Schweizer
Keyword(s):  
Ion Beam ◽  
Etching Process ◽  
Ion Beam Etching

Fabrication of ramp-type junctions using a two angle ion beam etching process

1999 ◽  
Vol 12 (11) ◽  
pp. 1016-1019 ◽  
Author(s):  
U Schoop ◽  
M Schonecke ◽  
S Schymon ◽  
T Bauch ◽  
A Marx ◽  
...  
Keyword(s):  
Ion Beam ◽  
Etching Process ◽  
Ion Beam Etching

Electron beam testing of VLSI circuits assisted by focused ion beam etching

1986 ◽  
Vol 4 (2) ◽  
pp. 107-120 ◽  
Author(s):  
Hideaki Arima ◽  
Takayuki Matsukawa ◽  
Junichi Mitsuhashi ◽  
Hiroaki Morimoto ◽  
Hidefumi Nakata
Keyword(s):  
Electron Beam ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Vlsi Circuits ◽  
Ion Beam Etching
Sign in / Sign up

Export Citation Format

Share Document