Fluorocarbon assisted atomic layer etching of SiO2 and Si using cyclic Ar/C4F8 and Ar/CHF3 plasma
2016 ◽
Vol 34
(1)
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pp. 01B101
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1995 ◽
Vol 13
(3)
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pp. 966-971
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2013 ◽
Vol 31
(6)
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pp. 061310
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Keyword(s):
2017 ◽
Vol 9
(39)
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pp. 34435-34447
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2017 ◽
Vol 35
(5)
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pp. 05C302
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2018 ◽
Vol 30
(23)
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pp. 8465-8475
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