Understanding time-resolved processes in atomic-layer etching of ultra-thin Al2O3 film using BCl3 and Ar neutral beam
2008 ◽
Vol 11
(4)
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pp. H71
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2005 ◽
Vol 8
(8)
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pp. C106
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2020 ◽
Vol 38
(3)
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pp. 032603
2009 ◽
Vol 54
(3)
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pp. 976-980
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2005 ◽
Vol 8
(11)
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pp. C177
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