Effect of oxygen plasma cleaning on nonswitching pseudo-Bosch etching of high aspect ratio silicon pillars

2020 ◽  
Vol 38 (1) ◽  
pp. 012804
Author(s):  
Ferhat Aydinoglu ◽  
Aixi Pan ◽  
Chenxu Zhu ◽  
Bo Cui
Keyword(s):  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Oxygen Plasma ◽  
Plasma Cleaning ◽  
Effect Of Oxygen ◽  
Silicon Pillars

Fabrication of high aspect ratio silicon pillars of <10 nm diameter

1993 ◽  
Vol 63 (8) ◽  
pp. 1116-1118 ◽  
Author(s):  
Wei Chen ◽  
Haroon Ahmed
Keyword(s):  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Silicon Pillars

High aspect ratio submicron silicon pillars fabricated by photoassisted electrochemical etching and oxidation

1995 ◽  
Vol 67 (13) ◽  
pp. 1877-1879 ◽  
Author(s):  
H. W. Lau ◽  
G. J. Parker ◽  
R. Greef ◽  
M. Hölling
Keyword(s):  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Electrochemical Etching ◽  
Silicon Pillars
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