Ferroelectric SrBi2Ta2O9 thin film deposition at 550 °C by plasma-enhanced metalorganic chemical vapor deposition onto a metalorganic chemical vapor deposition platinum bottom electrode

Vapor Deposition ◽

Bottom Electrode ◽

Chemical Vapor ◽

Thin Film Deposition ◽

Film Deposition ◽

Plasma-Enhanced Metalorganic Chemical Vapor Deposition for High Temperature Superconducting Thin Film

Materials Science Forum ◽

10.4028/www.scientific.net/msf.140-142.457 ◽

1993 ◽

Vol 140-142 ◽

pp. 457-464

Author(s):

Kenji Ebihara ◽

Tomoaki Ikegami

Keyword(s):

Thin Film ◽

High Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Superconducting Thin Film ◽

High Temperature Superconducting ◽

Titanium Dioxide Thin-Film Deposition on Polymer Substrate by Light Induced Chemical Vapor Deposition

Journal of The Electrochemical Society ◽

10.1149/1.1775931 ◽

2004 ◽

Vol 151 (9) ◽

pp. C571 ◽

Cited By ~ 12

Author(s):

E. Halary-Wagner ◽

F. Wagner ◽

P. Hoffmann

Keyword(s):

Thin Film ◽

Titanium Dioxide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Thin Film Deposition ◽

Film Deposition ◽

Polymer Substrate

The deposition behavior of SiO[sub 2]–TiO[sub 2] thin film by metalorganic chemical vapor deposition method

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1287154 ◽

2000 ◽

Vol 18 (5) ◽

pp. 2384 ◽

Cited By ~ 16

Author(s):

Si-Moo Lee ◽

Jeong-Hoon Park ◽

Kug-Sun Hong ◽

Woon-Jo Cho ◽

Dong-Lae Kim

Keyword(s):

Thin Film ◽

Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Deposition Behavior ◽

Electrical Properties of SrBi2Ta2O9 (SBT) Thin Film Prepared by Metalorganic Chemical Vapor Deposition

Key Engineering Materials ◽

10.4028/www.scientific.net/kem.181-182.93 ◽

2000 ◽

Vol 181-182 ◽

pp. 93-100

Author(s):

N. Nukaga ◽

Hiroshi Funakubo ◽

Ishikawa Kunio ◽

E. Shigeno ◽

Yutaka Sawada

Keyword(s):

Thin Film ◽

Electrical Properties ◽

Vapor Deposition ◽

Chemical Vapor ◽

ZnS:Mn thin-film electroluminescent devices prepared by metalorganic chemical vapor deposition

Journal of Crystal Growth ◽

10.1016/0022-0248(96)00321-1 ◽

1996 ◽

Vol 169 (1) ◽

pp. 33-39 ◽

Cited By ~ 20

Author(s):

Hideki Kina ◽

Yoji Yamada ◽

Yukihiro Maruta ◽

Yukihisa Tamura

Keyword(s):

Thin Film ◽

Vapor Deposition ◽

Chemical Vapor ◽

Electroluminescent Devices ◽

In Situ Mass Spectrometric Study of Pyrite (FeS[sub 2]) Thin Film Deposition with Metallorganic Chemical Vapor Deposition

Journal of The Electrochemical Society ◽

10.1149/1.1393437 ◽

2000 ◽

Vol 147 (5) ◽

pp. 1803 ◽

Cited By ~ 12

Author(s):

Liesbeth Reijnen ◽

Ben Meester ◽

Albert Goossens ◽

Joop Schoonman

Keyword(s):

Thin Film ◽

Vapor Deposition ◽

Chemical Vapor ◽

Mass Spectrometric Study ◽

Thin Film Deposition ◽

Mass Spectrometric ◽

Film Deposition ◽

Spectrometric Study

Phase transition of PbTiO3 polycrystalline thin film prepared by metalorganic chemical vapor deposition on yttrium stabilized zirconium

Solid State Communications ◽

10.1016/0038-1098(95)00465-3 ◽

1995 ◽

Vol 96 (7) ◽

pp. 477-480 ◽

Cited By ~ 4

Author(s):

Tao Yu ◽

Yan-Feng Chen ◽

Li Shun ◽

Jian-Xie Chen ◽

Nai-Ben Ming

Keyword(s):

Thin Film ◽

Phase Transition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Polycrystalline Thin Film ◽

Thin film channel waveguides fabricated in metalorganic chemical vapor deposition grown BaTiO3 on MgO

Applied Physics Letters ◽

10.1063/1.117746 ◽

1996 ◽

Vol 69 (20) ◽

pp. 2968-2970 ◽

Cited By ~ 67

Author(s):

D. M. Gill ◽

B. A. Block ◽

C. W. Conrad ◽

B. W. Wessels ◽

S. T. Ho

Keyword(s):

Thin Film ◽

Vapor Deposition ◽

Chemical Vapor ◽

Channel Waveguides ◽

Polycrystalline Si1-xGex thin film deposition by rapid thermal chemical vapor deposition

Journal of Materials Science Materials in Electronics ◽

10.1007/s10854-005-5138-3 ◽

2006 ◽

Vol 17 (1) ◽

pp. 27-33

Author(s):

Young-Bae Park ◽

Yong-Woo Choi ◽

Xiaodong Li

Keyword(s):

Thin Film ◽

Vapor Deposition ◽

Chemical Vapor ◽

Thin Film Deposition ◽

Film Deposition ◽

Thermal Chemical Vapor Deposition

Peculiarities of thin film deposition by means of reactive impulse plasma assisted chemical vapor deposition (RIPACVD) method

Thin Solid Films ◽

10.1016/j.tsf.2003.12.122 ◽

2004 ◽

Vol 459 (1-2) ◽

pp. 160-164 ◽

Cited By ~ 15

Author(s):

Aleksander Werbowy ◽

Andrzej Olszyna ◽

Krzysztof Zdunek ◽

Aleksandra Sokołowska ◽

Jan Szmidt ◽

...

Keyword(s):

Thin Film ◽

Vapor Deposition ◽

Chemical Vapor ◽

Thin Film Deposition ◽

Film Deposition