Temperature dependence of SiO2/Si interfacial structure formed by radio-frequency magnetron sputter deposited SiO2 thin films on Si(111)

1999 ◽  
Vol 17 (2) ◽  
pp. 552-554 ◽  
Author(s):  
Boquan Li ◽  
Toshiyuki Fujimoto ◽  
Isao Kojima
2002 ◽  
Vol 92 (1) ◽  
pp. 310-319 ◽  
Author(s):  
David L. Young ◽  
Helio Moutinho ◽  
Yanfa Yan ◽  
Timothy J. Coutts

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