Effect of Cerium and Magnesium on Surface Microcracks of Al–20Si Alloys Induced by High-Current Pulsed Electron Beam

The effect of Ce and Mg on surface microcracks of Al–20Si alloys induced via high-current pulsed electron beam (HCPEB) was studied. Mg was revealed to refine the primary Si phase in the pristine microstructure by forming a Mg2Si phase, leading to the suppression of microcrack propagation within the brittle phase after HCPEB irradiation. The incorporation of Ce into the Al–Si–Mg alloys further refined the primary Si phase and reduced the local stress concentration in the brittle phase induced by HCPEB irradiation. Ultimately, the surface microcracks were observed to be eliminated by the synergistic effects between the two elements. For Al–20Si–5Mg–0.7Ce alloys, Ce demonstrated a homogeneous distribution in the Al matrix on the HCPEB-irradiated alloy surface, while the Mg and Si exhibited a certain degree of aggregation in the Mg2Si phase. Metastable structures were formed on the HCPEB-irradiated alloy surface, including the nano-primary silicon phase, nano-cellular aluminium structure, and nano-Mg2Si phase. Compared with alloy specimens containing Mg, the Al–20Si–5Mg–0.7Ce alloy specimens exhibited an excellent anticorrosion property after HCPEB irradiation mainly due to the combined effects of the grain refinement and microcrack elimination.

Effect of High-Current Pulsed Electron Beam Processing of Zr-1%Nb Alloy on Its Oxidation Kinetics at 1200C in Air and Steam

The paper reports the effect of high-current pulsed electron beam (HCPEB) processing of the Zr-1%Nb alloy, as one of the most widely used in water-cooled nuclear reactors, on the kinetics of its oxidation at 1200 °C in air and steam (these conditions are typical for potential loss-of-coolant accidents). It was shown that HCPEB processing caused a change in the surface morphology of the samples. In particular, craters with diameters of about 100 μm were found on the modified surfaces. They had initiated at an energy density of 5 J/cm2 and were characterized by relevant reliefs with microcracks. After HCPEB processing at 10 J/cm2, the craters were deeper with fractured surface layers. In addition, a pronounced surface relief corresponding to quenched martensitic microstructures was observed on the modified sample surfaces that had formed due to high heating and cooling rates. Due to sufficient degradation of the sample surfaces after HCPEB processing at 10 J/cm2, the kinetics of high-temperature oxidation was estimated only for the as-received samples and ones treated at 5 J/cm2. It was found that the as-received samples showed slightly greater weight gain levels in both air and steam environments, which fully correlated with the thickness ratio of the oxide, α-Zr(O) and prior-β layers. These phenomena and further research directions were discussed.

FEATURES OF THE STRUCTURAL PHASE STATE OF A FILM BASED ON A HIGH-ENTROPY AlNbTiZrCu ALLOY SYNTHESIZED BY DEPOSITION OF A MULTIELEMENT METAL PLASMA

В данной работе приведены результаты структурных исследований пленок толщиной до 5 мкм высокоэнтропийных сплавов системы AlNbTiZrCu . Пленки были синтезированы на металлических и металлокерамических подложках путем осаждения многоэлементной металлической плазмы, созданной электродуговым плазменно ассистированным одновременным независимым распылением нескольких катодов. Показано, что пленки являются слоистым материалом и имеют аморфнокристаллическую структуру. Установлено, что облучение пленок импульсным электронным пучком (18 кэВ, 20 Дж/см, 50 мкс, 3 имп., 0,3 с) сопровождается кристаллизацией материала. Показано, что в полученных пленках доминирует соединение состава AlNbTiZr с параметром решетки 0,32344 нм. На основе теоретических расчетов получены структурные данные кристаллической решетки AlTiZrNb и определены механические и термодинамические характеристики этого соединения. This paper presents the results of structural studies of films with a thickness of up to 5 microns of high-entropy alloys of the AlNbTiZrCu system. The films were synthesized on metal and cermet substrates by deposition of a multielement metal plasma created by electric arc plasma assisted simultaneous independent sputtering of several cathodes. It is shown that the films are a layered material and have an amorphous-crystalline structure. It was found that irradiation of films with a pulsed electron beam (18 keV, 20 J/cm, 50 gs, 3 imp., 0,3 s) is accompanied by crystallization of the material. It is shown that the resulting films are dominated by the compound of the AlNbTiZr composition with the lattice parameter of 0,32344 nm. On the basis of theoretical calculations, the structural data of the crystal AlTiZrNb lattice were obtained, mechanical and thermodynamic characteristics of this compound were determined.

Experimental Study and Mathematical Modeling of the Processes Occurring in ZrN Coating/Silumin Substrate Systems under Pulsed Electron Beam Irradiation

This paper presents a study of a combined modification of silumin, which included deposition of a ZrN coating on a silumin substrate and subsequent treatment of the coating/substrate system with a submillisecond pulsed electron beam. The local temperature on the samples in the electron-beam-affected zone and the thickness of the melt zone were measured experimentally and calculated using a theoretical model. The Stefan problem was solved numerically for the fast heating of bare and ZrN-coated silumin under intense electron beam irradiation. Time variations of the temperature field, the position of the crystallization front, and the speed of the front movement have been calculated. It was found that when the coating thickness was increased from 0.5 to 2 μm, the surface temperature of the samples increased from 760 to 1070 °C, the rise rate of the surface temperature increased from 6 × 107 to 9 × 107 K/s, and the melt depth was no more than 57 μm. The speed of the melt front during the pulse was 3 × 105 µm/s. Good agreement was observed between the experimental and theoretical values of the temperature characteristics and melt zone thickness.

Spheroidization Behavior of Nano-Primary Silicon Induced by Neodymium under High-Current Pulsed Electron Beam Irradiation

The spheroidization behavior of the nano-primary silicon phase induced by Nd under high-current pulsed electron beam (HCPEB) irradiation was investigated in this study. The study results revealed that, compared to the Al–17.5Si alloy, spheroidized nano-primary silicon phase emerged in the alloy’s HCPEB-irradiated surface layer due to the presence of Nd. Because Nd was abundantly enriched on the fast-growing silicon crystal plane, its surface tension was reduced under the extreme undercooling caused by HCPEB irradiation, causing the growth velocity of each crystal plane to be the same and spherical nanometers of silicon to appear. The spheroidization of nano-primary silicon phases occurred in the remelted layer. The microhardness test revealed that Nd could depress the microhardness of the Al matrix at the same number of pulses, but conversely increase the microhardness of the primary silicon phase, compared to the Al–17.5Si alloy. The tribological test showed that the presence of spherical nano-primary silicon could significantly improve the alloy’s tribological property.

Radioluminescence Response of Ce-, Cu-, and Gd-Doped Silica Glasses for Dosimetry of Pulsed Electron Beams

Radiation-induced emission of doped sol-gel silica glass samples was investigated under a pulsed 20-MeV electron beam. The studied samples were drawn rods doped with cerium, copper, or gadolinium ions, which were connected to multimode pure-silica core fibers to transport the induced luminescence from the irradiation area to a signal readout system. The luminescence pulses in the samples induced by the electron bunches were studied as a function of deposited dose per electron bunch. All the investigated samples were found to have a linear response in terms of luminescence as a function of electron bunch sizes between 10−5 Gy/bunch and 1.5×10−2 Gy/bunch. The presented results show that these types of doped silica rods can be used for monitoring a pulsed electron beam, as well as to evaluate the dose deposited by the individual electron bunches. The electron accelerator used in the experiment was a medical type used for radiation therapy treatments, and these silica rod samples show high potential for dosimetry in radiotherapy contexts.