Fabrication of nanostructures in AlGaSb/InAs using electron-beam lithography and chemically assisted ion-beam etching

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.587626 ◽

1994 ◽

Vol 12 (6) ◽

pp. 3623 ◽

Author(s):

M. Arafa

Keyword(s):

Electron Beam ◽

Electron Beam Lithography ◽

Ion Beam ◽

Ion Beam Etching

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Fabrication of ultrafine anisotropic SiO2 mask by the combination of electron beam lithography and SF6 reactive ion beam etching using aluminum lift-off technique

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.587764 ◽

1994 ◽

Vol 12 (4) ◽

pp. 2356 ◽

Author(s):

Tohru Nishibe

Keyword(s):

Electron Beam ◽

Electron Beam Lithography ◽

Ion Beam ◽

Ion Beam Etching ◽

Lift Off ◽

Sio2 Mask ◽

Reactive Ion Beam Etching

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Fabrication of curved mirrors for visible semiconductor lasers using electron-beam lithography and chemically assisted ion-beam etching

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.586657 ◽

1993 ◽

Vol 11 (6) ◽

pp. 2514 ◽

Author(s):

P. Unger

Keyword(s):

Electron Beam ◽

Semiconductor Lasers ◽

Electron Beam Lithography ◽

Ion Beam ◽

Ion Beam Etching

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Facetless Bragg reflector surface-emitting AlGaAs/GaAs lasers fabricated by electron-beam lithography and chemically assisted ion-beam etching

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.585653 ◽

1991 ◽

Vol 9 (6) ◽

pp. 2842 ◽

Author(s):

R. C. Tiberio

Keyword(s):

Electron Beam ◽

Electron Beam Lithography ◽

Ion Beam ◽

Bragg Reflector ◽

Ion Beam Etching ◽

Reflector Surface

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Electron-beam lithography and chemically assisted ion beam etching for the fabrication of grating surface-emitting broad-area AlGaAs lasers

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.585087 ◽

1990 ◽

Vol 8 (6) ◽

pp. 1408 ◽

Author(s):

R. C. Tiberio

Keyword(s):

Electron Beam ◽

Electron Beam Lithography ◽

Ion Beam ◽

Ion Beam Etching

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Laterally coupled distributed feedback laser fabricated with electron-beam lithography and chemically assisted ion-beam etching

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.587435 ◽

1994 ◽

Vol 12 (6) ◽

pp. 3746 ◽

Author(s):

R. C. Tiberio

Keyword(s):

Electron Beam ◽

Electron Beam Lithography ◽

Ion Beam ◽

Distributed Feedback ◽

Distributed Feedback Laser ◽

Ion Beam Etching

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Laterally-Coupled Distributed Feedback laser fabricated with electron beam lithography and chemically assisted ion beam etching

Microelectronic Engineering ◽

10.1016/0167-9317(94)00057-2 ◽

1995 ◽

Vol 27 (1-4) ◽

pp. 67-70 ◽

Author(s):

R.C. Tiberio ◽

P.F. Chapman ◽

J.P. Drumheller ◽

R.D. Martin ◽

S. Forouhar ◽

...

Keyword(s):

Electron Beam ◽

Electron Beam Lithography ◽

Ion Beam ◽

Distributed Feedback ◽

Distributed Feedback Laser ◽

Ion Beam Etching

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Effect of Molecular Adsorption on the Electrical Conductance of Single Au Nanowires Fabricated by Electron-Beam Lithography and Focused Ion Beam Etching

Small ◽

10.1002/smll.201001295 ◽

2010 ◽

Vol 6 (22) ◽

pp. 2598-2603 ◽

Author(s):

Ping Shi ◽

Jingying Zhang ◽

Hsin-Yu Lin ◽

Paul W. Bohn

Keyword(s):

Electron Beam ◽

Electron Beam Lithography ◽

Focused Ion Beam ◽

Ion Beam ◽

Electrical Conductance ◽

Molecular Adsorption ◽

Ion Beam Etching ◽

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C60Resist Mask of Electron Beam Lithography for Chlorine-Based Reactive Ion Beam Etching

Japanese Journal of Applied Physics ◽

10.1143/jjap.37.4211 ◽

1998 ◽

Vol 37 (Part 1, No. 7A) ◽

pp. 4211-4212 ◽

Author(s):

Akihiro Matsutani ◽

Fumio Koyama ◽

Kenichi Iga

Keyword(s):

Electron Beam ◽

Electron Beam Lithography ◽

Ion Beam ◽

Ion Beam Etching ◽

Reactive Ion Beam Etching

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Fabrication of surface gratings in GaAs and AlGaAs by electron beam lithography and chemically assisted ion beam etching

10.1117/12.360145 ◽

1999 ◽

Author(s):

Jens Dienelt ◽

Karsten Otte ◽

Klaus-Peter Zimmer ◽

F. Pietag ◽

Frieder Bigl

Keyword(s):

Electron Beam ◽

Electron Beam Lithography ◽

Ion Beam ◽

Ion Beam Etching

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Direct-current and radio-frequency characterization of submicron striped-channel field effect transistor structures using focused ion beam and electron-beam lithography

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.585948 ◽

1992 ◽

Vol 10 (6) ◽

pp. 2945 ◽

Author(s):

M. M. Hashemi

Keyword(s):

Electron Beam ◽

Radio Frequency ◽

Direct Current ◽

Electron Beam Lithography ◽

Field Effect ◽

Field Effect Transistor ◽

Focused Ion Beam ◽

Ion Beam ◽

Effect Transistor

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