Realization of depth reference samples with surfaces amplitudes between 0.1 nm and 5 nm

A new approach for the realization of depth reference samples is presented. By a combination of photolithography, reactive ion beam etching, surface planarization with photoresists and a subsequent coating with non-transparent materials, defined sinusoidal surface profiles are generated which can be used as depth references for the comparison and calibration of different surface profile measurements. The smallest realized surface amplitudes are in the range of less than 0.1 nm.

Figuring of optical aluminium devices by reactive ion beam etching

Ion beam figuring (IBF) is an established method in high-end surface manufacturing. However, the direct processing of desired materials as standard Al alloys (e.g. Al6061)fails, since the surface roughness increases drastically as a result of inhomogeneous etching due to structural, crystallographic and chemical irregularities inside the material matrix. As an alternative figuring technology reactive ion-beam etching (RIBE) is a promising route. RIBE provides the direct machining of Al alloys while preserving the surface roughness almostin its initial state. The RIBE process with nitrogengasis focused more detailedin this study.

Traceless mitigation of laser damage precursors on a fused silica surface by combining reactive ion beam etching with dynamic chemical etching

RIBE and DCE techniques can be combined to tracelessly mitigate laser damage precursors on a fused silica surface.