Effect of Molecular Adsorption on the Electrical Conductance of Single Au Nanowires Fabricated by Electron-Beam Lithography and Focused Ion Beam Etching

Small ◽  
2010 ◽  
Vol 6 (22) ◽  
pp. 2598-2603 ◽  
Author(s):  
Ping Shi ◽  
Jingying Zhang ◽  
Hsin-Yu Lin ◽  
Paul W. Bohn
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Electrical Conductance ◽  
Molecular Adsorption ◽  
Ion Beam Etching ◽  
Au Nanowires

Electron beam testing of VLSI circuits assisted by focused ion beam etching

1986 ◽  
Vol 4 (2) ◽  
pp. 107-120 ◽  
Author(s):  
Hideaki Arima ◽  
Takayuki Matsukawa ◽  
Junichi Mitsuhashi ◽  
Hiroaki Morimoto ◽  
Hidefumi Nakata
Keyword(s):  
Electron Beam ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Vlsi Circuits ◽  
Ion Beam Etching

scholarly journals Direct comparison of domain wall behavior in permalloy nanowires patterned by electron beam lithography and focused ion beam milling

2011 ◽  
Vol 110 (8) ◽  
pp. 083904 ◽  
Author(s):  
M. A. Basith ◽  
S. McVitie ◽  
D. McGrouther ◽  
J. N. Chapman ◽  
J. M. R. Weaver
Keyword(s):  
Electron Beam ◽  
Domain Wall ◽  
Electron Beam Lithography ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Focused Ion Beam Milling

Fabrication of coaxial plasmonic crystals by focused ion beam milling and electron-beam lithography

2013 ◽  
Vol 100 ◽  
pp. 192-194 ◽  
Author(s):  
Xiaoxiao Jiang ◽  
Qiongchan Gu ◽  
Fengwen Wang ◽  
Jiangtao Lv ◽  
Zhenhe Ma ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Plasmonic Crystals ◽  
Focused Ion Beam Milling
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