Application of broad-beam scanning exposure to fabricate low-wavefront-error holographic gratings

2021 ◽  
Vol 60 (04) ◽  
Author(s):  
Yuxuan Zhao ◽  
Lijiang Zeng ◽  
Lifeng Li
2011 ◽  
Author(s):  
Jinjun Xia ◽  
Chen-Wei Wei ◽  
Lingyun Huang ◽  
I. M. Pelivanov ◽  
Matthew O'Donnell

2006 ◽  
Vol 133 ◽  
pp. 645-648 ◽  
Author(s):  
B. E. Kruschwitz ◽  
R. Jungquist ◽  
J. Qiao ◽  
S. Abbey ◽  
S. E. Dean ◽  
...  

Author(s):  
Y. Lu ◽  
E. Ramsay ◽  
C. Stockbridge ◽  
F. H. Koklu ◽  
A. Yurt ◽  
...  

Abstract We present a method for correcting spherical aberrations in solid immersion microscopy through the use of a deformable mirror. Aberrations in solid immersion imaging for failure analysis can be induced through off-axis imaging, errors in lens fabrication or mismatch of design and substrate wafer thickness. RMS wavefront error correction of 30% is demonstrated in the case of substrate wafer thickness error.


2014 ◽  
Vol 22 (20) ◽  
pp. 24224 ◽  
Author(s):  
Shane Z. Sullivan ◽  
Ryan D. Muir ◽  
Justin A. Newman ◽  
Mark S. Carlsen ◽  
Suhas Sreehari ◽  
...  

Micromachines ◽  
2012 ◽  
Vol 3 (2) ◽  
pp. 509-528 ◽  
Author(s):  
Ulrich Hofmann ◽  
Joachim Janes ◽  
Hans-Joachim Quenzer

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