Silicate glass film deposition from gas discharge initiated by laser plasma

1996 ◽  
Author(s):  
Valerie A. Astapenko ◽  
Oleg E. Sidoryuk
1994 ◽  
Vol 361 ◽  
Author(s):  
E. Sviridov ◽  
I. Sem ◽  
V. Alyoshih ◽  
S. Biryukov ◽  
V. Dudkevich

ABSTRACTIn the present paper three mechanisms of self-polarization of ferroelectric crystals are discussed: polarization by the crystal bending, that by the “organized” Phase transition and that by the internal field. It is shown that these mechanisms operate also in the case of films. However, the using of cathode sputtering leads to the appearance of two new mechanisms: polarization by the field biasing the substrate with respect to the gas discharge at the film deposition temperature Ts below the Curie point temperature Tc (Ts < TO; and polarization by the field captured by the traps of the negative charge having no time to relax for the time of cooling the film to Tc (Ts > Tc).


1977 ◽  
Vol 7 (9) ◽  
pp. 1136-1138
Author(s):  
A P Gagarin ◽  
L B Glebov ◽  
V G Dokuchaev
Keyword(s):  

2002 ◽  
Author(s):  
Frank Flohrer ◽  
Kai Gaebel ◽  
Diethard Kloepfel ◽  
Peter Koehler ◽  
Imtiaz Ahmad ◽  
...  

1997 ◽  
Author(s):  
Masayuki Yamane ◽  
Shuichi Shibata ◽  
Tetsuji Yano ◽  
Kenichi Watanabe
Keyword(s):  

1983 ◽  
Vol 22 (S1) ◽  
pp. 167
Author(s):  
Kinya Kato ◽  
Keizo Shuto ◽  
Masahiko Hasegawa

1982 ◽  
Author(s):  
Kinya Kato ◽  
Keizo Shuto ◽  
Masahiko Hasegawa

Author(s):  
Ray‐Jay Jeng ◽  
Tetsuo Kishi ◽  
Nobuhiro Matsushita ◽  
Tetsuji Yano

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