The risks of invisibilization of populations and places in environment-migration research

Recent years have seen an increase in the use of secondary data in climate adaptation research. While these valuable datasets have proven to be powerful tools for studying the relationships between people and their environment, they also introduce unique oversights and forms of invisibility, which have the potential to become endemic in the climate adaptation literature. This is especially dangerous as it has the potential to introduce a double exposure where the individuals and groups most likely to be invisible to climate adaptation research using secondary datasets are also the most vulnerable to climate change. Building on significant literature on invisibility in survey data focused on hard-to-reach and under-sampled populations, we expand the idea of invisibility to all stages of the research process. We argue that invisibility goes beyond a need for more data. The production of invisibility is an active process in which vulnerable individuals and their experiences are made invisible during distinct phases of the research process and constitutes an injustice. We draw on examples from the specific subfield of environmental change and migration to show how projects using secondary data can produce novel forms of invisibility at each step of the project conception, design, and execution. In doing so, we hope to provide a framework for writing people, groups, and communities back into projects that use secondary data and help researchers and policymakers incorporate individuals into more equitable climate planning scenarios that “leave no one behind.”

Fabrication of Oblique Submicron-Scale Structures Using Synchrotron Hard X-ray Lithography

Oblique submicron-scale structures are used in various aspects of research, such as the directional characteristics of dry adhesives and wettability. Although deposition, etching, and lithography techniques are applied to fabricate oblique submicron-scale structures, these approaches have the problem of the controllability or throughput of the structures. Here, we propose a simple X-ray-lithography method, which can control the oblique angle of submicron-scale structures with areas on the centimeter scale. An X-ray mask was fabricated by gold film deposition on slanted structures. Using this mask, oblique ZEP520A photoresist structures with slopes of 20° and 10° and widths of 510 nm and 345 nm were fabricated by oblique X-ray exposure, and the possibility of polydimethylsiloxane (PDMS) molding was also confirmed. In addition, through double exposure with submicron- and micron-scale X-ray masks, dotted-line patterns were produced as an example of multiscale patterning.