Maskless lithography: estimation of the number of shots for each layer in a logic device with character-projection-type low-energy electron-beam direct writing system
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2002 ◽
Vol 20
(1)
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pp. 25
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2002 ◽
Vol 20
(6)
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pp. 2651
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2007 ◽
Vol 46
(9B)
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pp. 6161-6165
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