Novel 3D grid porous Li4Ti5O12 thick electrodes fabricated by 3D printing for high performance lithium-ion batteries

Three-dimensional (3D) grid porous electrodes introduce vertically aligned pores as a convenient path for the transport of lithium-ions (Li-ions), thereby reducing the total transport distance of Li-ions and improving the reaction kinetics. Although there have been other studies focusing on 3D electrodes fabricated by 3D printing, there still exists a gap between electrode design and their electrochemical performance. In this study, we try to bridge this gap through a comprehensive investigation on the effects of various electrode parameters including the electrode porosity, active material particle diameter, electrode electronic conductivity, electrode thickness, line width, and pore size on the electrochemical performance. Both numerical simulations and experimental investigations are conducted to systematically examine these effects. 3D grid porous Li4Ti5O12 (LTO) thick electrodes are fabricated by low temperature direct writing technology and the electrodes with the thickness of 1085 µm and areal mass loading of 39.44 mg·cm−2 are obtained. The electrodes display impressive electrochemical performance with the areal capacity of 5.88 mAh·cm−[email protected] C, areal energy density of 28.95 J·cm−[email protected] C, and areal power density of 8.04 mW·cm−[email protected] C. This study can provide design guidelines for obtaining 3D grid porous electrodes with superior electrochemical performance.

Influence of process parameters on the characteristics of electrohydrodynamic-printed UV-curing conductive lines on the fabric

As a similar technology to the near-field static electrospinning, the emerging electrohydrodynamic (EHD) printing technology with digital printing process and compatibility of viscous particle-blended inks is one of the simplest methods of fabricating multifunctional electronic textiles.With increasing demands for textile-based conductive lines with controllable width and excellent electrical performance, it’s of great importance to know the influence of key process parameters on the morphology and electrical properties of EHD-printed UV-curing conductive lines on the fabric. This work will systematically explore the effect of the EHD printing process parameters (i.e. applied voltage, direct-writing height, flow rate and moving velocity of the substrate) on the morphology and electrical performance of the EHD-printed textile-based conductive lines, especially focus on the diffusion and penetration of inks on the rough and porous fabric. The UV-curing nano-silver ink with low temperature and fast curing features was selected, and the line width and electrical resistance of printed lines under different process parameters were observed and measured. The results showed that, unlike previous results about EHD printing on smooth and impermeable substrates, the ink diffusion related to fabric textures had a greater effect on the fabric-based conductive line width than the applied voltage and direct-writing height in the case of a stable jet. Meanwhile, the relationship between the line width and the flow rate met the equation of = 407.28 ∗ 1⁄2 , and the minimum volume on fabric per millimeter was 0.67μL to form continuous line with low electrical resistance. Additionally, the higher substrate moving velocity resulted in a smaller line width, while it deteriorated the thickness uniformity and electrical property of printed lines. Generally, due to the effect of surface structure of the fabric on the spreading and penetrating behavior of inks, the flow rate and the substrate moving velocity are two significant parameters ensuring the electrical property of printed lines. It is believed that these findings will provide some guides for applying electrohydrodynamic printing technology into flexible electronics on the woven fabric.

Microcrater-Arrayed Chemiluminescence Cell Chip to Boost Anti-Cancer Drug Administration in Zebrafish Tumor Xenograft Model

Purpose: The aim of this study was to develop a rapid and automatic drug screening platform using microcrater-arrayed (µCA) cell chips. Methods: The µCA chip was fabricated using a laser direct writing technique. The fabrication time required for one 9 × 9 microarray wax chip was as quick as 1 min. On a nanodroplet handling platform, the chip was pre-coated with anti-cancer drugs, including cyclophosphamide, cisplatin, doxorubicin, oncovin, etoposide, and 5-fluorouracil, and their associated mixtures. Cell droplets containing 100 SK-N-DZ or MCF-7 cells were then loaded onto the chip. Cell viability was examined directly through a chemiluminescence assay on the chip using the CellTiter-Glo assay. Results: The time needed for the drug screening assay was demonstrated to be less than 30 s for a total of 81 tests. The prediction of optimal drug synergy from the µCA chip was found by matching it to that of the zebrafish MCF-7 tumor xenograft model, instead of the conventional 96-well plate assay. In addition, the critical reagent volume and cell number for each µCA chip test were 200 nL and 100 cells, respectively, which were significantly lower than 100 µL and 4000 cells, which were achieved using the 96-well assay. Conclusion: Our study for the µCA chip platform could improve the high-throughput drug synergy screening targeting the applications of tumor cell biology.

Fabrication of Large Area, Ordered Nanoporous Structures on Various Substrates for Potential Electro-Optic Applications

Nanoporous structures have attracted great attention in electronics, sensor and storage devices, and photonics because of their large surface area, large volume to surface ratio, and potential for high-sensitivity sensor applications. Normally, electron or ion beam patterning can be used for nanopores fabrication by direct writing. However, direct writing is a rather expensive and time-consuming method due to its serial nature. Therefore, it may not translate to a preferred manufacturing process. In this research, a perfectly ordered large-area periodic pattern in an area of approximately 1 cm2 has been successfully fabricated on various substrates including glass, silicon, and polydimethylsiloxane, using a two-step process comprising visible light-based multibeam interference lithography and subsequent pattern transfer processes of reactive ion etching and nanomolding. Additionally, the multibeam interference lithography templated anodized aluminum oxide process has been described. Since the fabrication area in multibeam interference lithography can be extended by using a larger beam size, it is highly cost effective and manufacturable. Furthermore, although not described here, an electrodeposition process can be utilized as a pattern transfer process. This large-area perfectly ordered nanopore array will be very useful for high-density electronic memory and photonic bandgap and metamaterial applications.