Quaternary InAlGaN-based deep-UV LED with high-Al-content p-type AlGaN

Author(s):  
Hideki Hirayama ◽  
Yoshinobu Aoyagi
Keyword(s):  
Uv Led ◽  
Deep Uv ◽  
P Type ◽  
2004 ◽  
Vol 201 (12) ◽  
pp. 2803-2807 ◽  
Author(s):  
Toshiyuki Obata ◽  
Hideki Hirayama ◽  
Yoshinobu Aoyagi ◽  
Koji Ishibashi

1996 ◽  
Vol 423 ◽  
Author(s):  
J. Bernholc ◽  
P. Boguslawski ◽  
E. L. Briggs ◽  
M. Buongiorno Nardelli ◽  
B. Chen ◽  
...  

AbstractThe results of extensive theoretical studies of group IV impurities and surface and interface properties of nitrides are presented and compared with available experimental data. Among the impurities, we have considered substitutional C, Si, and Ge. CN is a very shallow acceptor, and thus a promising p-type dopant. Both Si and Ge are excellent donors in GaN. However, in AlGaN alloys the DX configurations are stable for a sufficiently high Al content, which quenches the doping efficiency. At high concentrations, it is energetically favorable for group IV impurities to form nearest-neighbor Xcation-XN pairs. Turning to surfaces, AIN is known to exhibit NEA. We find that the NEA property depends sensitively on surface reconstruction and termination. At interfaces, the strain effects on the band offsets range from 20% to 40%, depending on the substrate. The AIN/GaN/InN interfaces are all of type I, while the A10.5Ga0.5 N/A1N zinc-blende (001) interface may be of type II. Further, the calculated bulk polarizations in wurtzite AIN and GaN are -1.2 and -0.45 μC/cm2, respectively, and the interface contribution to the polarization in the GaN/AlN wurtzite multi-quantum-well is small.


2005 ◽  
Vol 86 (8) ◽  
pp. 082107 ◽  
Author(s):  
S.-R. Jeon ◽  
Z. Ren ◽  
G. Cui ◽  
J. Su ◽  
M. Gherasimova ◽  
...  
Keyword(s):  
P Type ◽  

2013 ◽  
Vol 102 (1) ◽  
pp. 012105 ◽  
Author(s):  
Toru Kinoshita ◽  
Toshiyuki Obata ◽  
Hiroyuki Yanagi ◽  
Shin-ichiro Inoue

2005 ◽  
Vol 892 ◽  
Author(s):  
M. Asif Khan

AbstractIn this paper we will describe the problems in growth and fabrication of deep UV LED devices and the approaches that we have used to grow AlGaN-based multiple quantum well deep UV LED structures and to overcome issues of doping efficiency, cracking, and slow growth rates both for the n- and the p-type layers of the device structures. Several innovations in structure growth, device structure design and fabrication and packaging have led to the fabrication of devices with emission from 250-300 nm and cw-milliwatt powers at pump currents of only 20 mA (Vf ≤ 6 V). Record wall plug efficiencies above 1.5 % are now achievable for devices with emission at 280 nm. Thermal management and a proper device design are not only key factors in achieving these record performance numbers but are also crucial to device reliability. We will also discuss some of our initial research to clarify the factors influencing the lifetime of the deep UV LEDs. In addition to our own work, we will review the results from the excellent research carried out at several other laboratories worldwide.


Nanoscale ◽  
2021 ◽  
Author(s):  
Shiqiang Lu ◽  
Xinjun Jiang ◽  
Yaozeng Wang ◽  
Kai Huang ◽  
Na Gao ◽  
...  

The external quantum efficiency of a high-Al content (>0.6) AlGaN deep-ultraviolet (DUV) light-emitting diode is typically below 1% in the sub-250 nm wavelength range. One of the main reasons for...


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