Error reduction in three-dimensional metrology combining optical and touch probe data

2010 ◽  
Author(s):  
Janice R. Gerde ◽  
William A. Christens-Barry
Keyword(s):  
Three Dimensional ◽  
Error Reduction ◽  
Dimensional Metrology ◽  
Touch Probe

Three-dimensional metrology in MEMS applications

2002 ◽  
Author(s):  
Alexander Friz ◽  
Keith F. Best ◽  
Satinderpall Pannu ◽  
Jocelyn T. Nee
Keyword(s):  
Three Dimensional ◽  
Dimensional Metrology

Three-dimensional metrology frame for precision applications

1999 ◽  
Vol 23 (2) ◽  
pp. 103-112 ◽  
Author(s):  
J.F. Cuttinoa ◽  
D.E. Schinstock ◽  
M.J. Prather
Keyword(s):  
Three Dimensional ◽  
Dimensional Metrology

scholarly journals The Digitalisation in Cobalt-Chromium Framework Fabrication. Surface Roughness Analysis: A Pilot Study

2021 ◽  
Vol 50 (10) ◽  
pp. 3059-3065
Author(s):  
Aini Hayati Abdul Rahim ◽  
Zubaidah Zanul Abidin ◽  
Norsiah Yunus
Keyword(s):  
Surface Roughness ◽  
Three Dimensional ◽  
Conventional Group ◽  
Chromium Alloy ◽  
Cobalt Chromium ◽  
Dimensional Metrology ◽  
Removable Partial Denture ◽  
Casting Technique ◽  
Significant Difference ◽  
Roughness Analysis

Selective laser melting (SLM) is a new technique in fabricating cobalt-chromium denture framework. However, the surface properties of cobalt-chromium denture framework fabricated using the aforementioned technique have not been widely investigated. The aim of this paper was to investigate the surface roughness of cobalt-chromium alloy in removable partial denture fabricated with SLM technique. Cobalt-chromium denture frameworks were fabricated with two techniques (n = 10); the conventional lost-wax casting (conventional group) and SLM techniques (SLM group). Specimens from the conventional group were subjected to the standard cobalt-chromium denture polishing protocols. No treatment was employed for specimens from the SLM group. All specimens were subjected to surface roughness measurement on polished and fitting surfaces using non-contact optical three-dimensional metrology and surface roughness analysis machine (Infinite Focus Real 3D Alicona). Statistical analysis showed no significant difference in surface roughness between the specimens from conventional and SLM groups (p > 0.05). There was no statistically significant difference in surface roughness between the polished and fitting surfaces of SLM specimens (p > 0.05). Surface roughness quality of the cobalt-chromium denture framework fabricated with the SLM technique is comparable to that fabricated with the conventional lost-wax casting technique. The surface roughness of SLM fabricated cobalt-chromium denture frameworks carries the same surface roughness quality between the polished and fitting surfaces.

X-ray characterization of contact holes for block copolymer lithography

2019 ◽  
Vol 52 (1) ◽  
pp. 106-114
Author(s):  
Daniel F. Sunday ◽  
Florian Delachat ◽  
Ahmed Gharbi ◽  
Guillaume Freychet ◽  
Christopher D. Liman ◽  
...  
Keyword(s):  
Self Assembly ◽  
Low Cost ◽  
Ion Beam ◽  
Three Dimensional ◽  
Incident Beam ◽  
Residual Layer ◽  
Processing Conditions ◽  
Dimensional Metrology ◽  
Grid Pattern ◽  
X Ray

The directed self-assembly (DSA) of block copolymers (BCPs) is a promising low-cost approach to patterning structures with critical dimensions (CDs) which are smaller than can be achieved by traditional photolithography. The CD of contact holes can be reduced by assembling a cylindrical BCP inside a patterned template and utilizing the native size of the cylinder to dictate the reduced dimensions of the hole. This is a particularly promising application of the DSA technique, but in order for this technology to be realized there is a need for three-dimensional metrology of the internal structure of the patterned BCP in order to understand how template properties and processing conditions impact BCP assembly. This is a particularly challenging problem for traditional metrologies owing to the three-dimensional nature of the structure and the buried features. By utilizing small-angle X-ray scattering and changing the angle between the incident beam and sample we can reconstruct the three-dimensional shape profile of the empty template and the residual polymer after self-assembly and removal of one of the phases. A two-dimensional square grid pattern of the holes results in scattering in both in-plane directions, which is simplified by converting to a radial geometry. The shape is then determined by simulating the scattering from a model and iterating that model until the simulated and experimental scattering profiles show a satisfactory match. Samples with two different processing conditions are characterized in order to demonstrate the ability of the technique to evaluate critical features such as residual layer thickness and sidewall height. It was found that the samples had residual layer thicknesses of 15.9 ± 3.2 nm and 4.5 ± 2.2 nm, which were clearly distinguished between the two different DSA processes and in good agreement with focused ion beam scanning transmission electron microscopy (FIBSTEM) observations. The advantage of the X-ray measurements is that FIBSTEM characterizes around ten holes, while there are of the order of 800 000 holes illuminated by the X-ray beam.

Three Dimensional Mask Metrology by Off-Axis Electron Holography

2001 ◽  
Vol 7 (S2) ◽  
pp. 574-575
Author(s):  
Bernhard Frost ◽  
David C Joy
Keyword(s):  
Three Dimensional ◽  
Ccd Camera ◽  
Electron Holography ◽  
Dimensional Metrology ◽  
Transmission Electron ◽  
Stereo Photogrammetry ◽  
Real Objects ◽  
Electron Microscopes ◽  
Third Dimension ◽  
Scanning Electron Microscopes

Even though all real objects are three dimensional, imaging and metrology performed by using electron-beam tools such as scanning electron microscopes is inherently two dimensional. Any information about the third dimension must therefore be obtained by inference, or by time consuming special methods such as stereo-photogrammetry. If, however, the structures of interest are thin enough to be electron transparent then quantitative three dimensional metrology can be performed directly by using off-axis transmission electron holography. Here we demonstrate the application to a SCALPEL lithography mask which consists of chromium lines on a silicon support film. The off-axis holography was performed in a field emission transmission electron microscope, a Hitachi HF2000 operated at 200keV. The sample is positioned so that half the beam passes through the specimen while the rest travels only through the vacuum. An electrostatic biprism then recombines these two components to form the hologram which is recorded onto a CCD camera.

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