Obtaining TiN Coatings by Reactive Anodic Evaporation of Titanium in a Gas Discharge with a Self-Heated Hollow Cathode

Author(s):  
A. I. Men’shakov ◽  
D. R. Emlin
Author(s):  
А.И. Меньшаков ◽  
Д.Р. Емлин

A method for TiN-coatings deposition by anodic evaporation of titanium in a high-current gas discharge (30 A) with a self–heated hollow cathode in an Ar+N2 medium is proposed. Optical spectral analysis shows that a large amount of activated titanium is present in the gas-discharge plasma, and the proportion of metal ions coming from the plasma to the substrate, taking into account the single-charge ions, reaches 70%. At a nitrogen flow of 5 sccm, TiN-coatings with a thickness of 2 µm and a hardness of up to 24 GPa were obtained. The deposition rate at a distance of 7 cm from the vapor source was ~4 µm/h.


1971 ◽  
Vol 7 (3) ◽  
pp. 61 ◽  
Author(s):  
I.I. Aksenov ◽  
V.A. Belous ◽  
S.A. Smirnov

1975 ◽  
Vol 46 (10) ◽  
pp. 4392-4399 ◽  
Author(s):  
Hideomi Matsuzaki ◽  
Yutaka Imahori ◽  
Takeo Kamegaya

2008 ◽  
Vol 51 (2) ◽  
pp. 311-314 ◽  
Author(s):  
A. I. Stognii ◽  
A. A. Serov ◽  
S. V. Koryakin ◽  
V. V. Pan’kov

2012 ◽  
Vol 40 (8) ◽  
pp. 2079-2082 ◽  
Author(s):  
Alexander E. Dubinov ◽  
Igor L. L'vov ◽  
Sergey A. Sadovoy ◽  
Victor D. Selemir ◽  
Dmitry V. Vyalykh ◽  
...  

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