TEMPERATURE DEPENDENCE OF TERAHERTZ EMISSION FROM SILICON DEVICES DOPED WITH BORON

2004 ◽  
Vol 14 (03) ◽  
pp. 670-675
Author(s):  
R. T. TROEGER ◽  
T. N. ADAM ◽  
S. K. RAY ◽  
P.-C. LV ◽  
S. KIM ◽  
...  

In this paper, we report on electrically pumped terahertz emitters based on silicon doped with boron acceptors. At cryogenic temperatures, three narrow spectral emission lines attributed to radiative transitions from p-like excited hydrogenic states to the s-like Γ8 ground state associated with the boron dopants were observed centered around 8 THz. The spectral emission line center frequencies were in remarkable agreement with values reported from absorption measurements and theoretical calculations. The total time-resolved terahertz emission power was found to be up to 31 μW per device facet. We have solved the rate equations describing the populations in the hydrogenic dopant states involved in the emission mechanism and derived expressions for the current pumping and temperature dependence of the emitted terahertz power, yielding excellent agreement with the experimental data. These results suggest that silicon-based terahertz emitters may be fabricated without epitaxial quantum wells. The observed temperature dependence suggests that electric field assisted thermal escape of carriers from upper hydrogenic states may be responsible for lower output powers at higher temperatures.

1969 ◽  
Vol 47 (15) ◽  
pp. 1573-1583 ◽  
Author(s):  
G. J. Lichtenberger

Detailed measurements of the angular and temperature dependence (1.6 °K to 4.2 °K) of the dominant spin–lattice relaxation rates of Fe3+ in rutile have been carried out for a number of strong transitions at 9.4 Gc and 121 Gc using the pulse saturation method. At 9.4 Gc, two relaxation time components were observed, ranging from 0.5 to 1.2 ms and 1.6 to 4.0 ms, respectively, at 4.2 °K. Assuming a relationship of the form log(relaxation time) = −n∙log(temperature), the temperature dependence factor n was found to be between 0.4 and 1.0. The single relaxation time resolved at F band had values from 0.7 to 1.0 ms at 4.2 °K, and n between 0.1 and 0.6. The corresponding relative relaxation rates were calculated from the direct process spin–phonon transition probabilities, assuming Debye elastic isotropy for rutile. Using a cubic spin–lattice coupling tensor, [Formula: see text] was found to be 0.5 and the rate equations for the six-level system were solved. The calculated effective relaxation times were successfully identified with the slower dominant relaxation component of the experimental data.


Author(s):  
J. Allègre ◽  
P. Lefebvre ◽  
J. Camassel ◽  
B. Beaumont ◽  
Pierre Gibart

Time-resolved photoluminescence spectra have been recorded on three GaN epitaxial layers of thickness 2.5 μm, 7 μm and 16 μm, at various temperatures ranging from 8K to 300K. The layers were deposited by MOVPE on (0001) sapphire substrates with standard AlN buffer layers. To achieve good homogeneities, the growth was in-situ monitored by laser reflectometry. All GaN layers showed sharp excitonic peaks in cw PL and three excitonic contributions were seen by reflectivity. The recombination dynamics of excitons depends strongly upon the layer thickness. For the thinnest layer, exponential decays with τ ~ 35 ps have been measured for both XA and XB free excitons. For the thickest layer, the decay becomes biexponential with τ1 ~ 80 ps and τ2 ~ 250 ps. These values are preserved up to room temperature. By solving coupled rate equations in a four-level model, this evolution is interpreted in terms of the reduction of density of both shallow impurities and deep traps, versus layer thickness, roughly following a L−1 law.


2004 ◽  
Vol 85 (17) ◽  
pp. 3660-3662 ◽  
Author(s):  
P.-C. Lv ◽  
R. T. Troeger ◽  
S. Kim ◽  
S. K. Ray ◽  
K. W. Goossen ◽  
...  

1992 ◽  
Vol 7 (3B) ◽  
pp. B133-B136 ◽  
Author(s):  
W Sha ◽  
T B Norris ◽  
W J Schaff ◽  
K E Meyer
Keyword(s):  

2002 ◽  
Vol 190 (3) ◽  
pp. 715-718 ◽  
Author(s):  
F. Teppe ◽  
C. Camilleri ◽  
D. Scalbert ◽  
Y.G. Semenov ◽  
M. Nawrocki ◽  
...  

2005 ◽  
Vol 480-481 ◽  
pp. 283-285 ◽  
Author(s):  
K. Wakita ◽  
K. Nishi ◽  
Y. Ohta ◽  
T. Onishi

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