Exciton dynamics in thick GaN MOVPE epilayers deposited on sapphire.

1997 ◽  
Vol 2 ◽  
Author(s):  
J. Allègre ◽  
P. Lefebvre ◽  
J. Camassel ◽  
B. Beaumont ◽  
Pierre Gibart
Keyword(s):  
Layer Thickness ◽  
Buffer Layers ◽  
Rate Equations ◽  
Time Resolved ◽  
Versus Layer ◽  
Level Model ◽  
Shallow Impurities ◽  
Aln Buffer ◽  
Time Resolved Photoluminescence

Time-resolved photoluminescence spectra have been recorded on three GaN epitaxial layers of thickness 2.5 μm, 7 μm and 16 μm, at various temperatures ranging from 8K to 300K. The layers were deposited by MOVPE on (0001) sapphire substrates with standard AlN buffer layers. To achieve good homogeneities, the growth was in-situ monitored by laser reflectometry. All GaN layers showed sharp excitonic peaks in cw PL and three excitonic contributions were seen by reflectivity. The recombination dynamics of excitons depends strongly upon the layer thickness. For the thinnest layer, exponential decays with τ ~ 35 ps have been measured for both XA and XB free excitons. For the thickest layer, the decay becomes biexponential with τ1 ~ 80 ps and τ2 ~ 250 ps. These values are preserved up to room temperature. By solving coupled rate equations in a four-level model, this evolution is interpreted in terms of the reduction of density of both shallow impurities and deep traps, versus layer thickness, roughly following a L−1 law.

Microstructures of AlN Buffer Layers for the Growth of GaN on (0001) Al2O3

1996 ◽  
Vol 449 ◽  
Author(s):  
M. Yeadon ◽  
W. Kim ◽  
A. E. Botchkarev ◽  
S. N. Mohammad ◽  
H. Morkoc ◽  
...  
Keyword(s):  
Lattice Mismatch ◽  
Wide Band ◽  
Buffer Layers ◽  
Initial Growth ◽  
Nitridation Time ◽  
Transmission Electron ◽  
Different Temperatures ◽  
Aln Buffer ◽  
Nitride Layers

ABSTRACTIll-nitride semiconductors are emerging as highly promising candidates for the fabrication of wide band-gap electronic and opto-electronic devices. Sapphire ((α-A12O3) is currently one of the primary substrates of choice for the growth of GaN despite a large lattice mismatch. Significant improvements in the quality of III-nitride layers have been demonstrated by exposure of the substrate to reactive nitrogen species followed by deposition of a low temperature AIN or GaN buffer layer. In this paper we present a study of the evolution of the surface topography and defect microstructure of nitrided α-A12O3 substrates and AIN buffer layers deposited by reactive molecular beam epitaxy (RMBE). Their influence on the morphology and properties of GaN layers is also discussed. Both nitridation time and AIN deposit thickness were varied systematically, at different temperatures and buffer growth rates. The microstructures were characterized using the atomic force microscope (AFM) and transmission electron microscope (TEM). Initial growth studies are ideally suited to in-situ experiments, and further investigations are also in progress using a unique UHV TEM with the facility for in-situ RMBE.

Preparation and Time Resolved Photoluminescence of Nanoscale InP Islands in In0.48Ga0.52P

1995 ◽  
Vol 379 ◽  
Author(s):  
K. Eberl ◽  
A. Kurtenbach ◽  
K. HÄusler ◽  
F. Noll ◽  
W.W. RÜhle
Keyword(s):  
Lattice Mismatch ◽  
Excitation Power ◽  
Buffer Layers ◽  
Time Resolved ◽  
Force Microscopy ◽  
Self Assembling ◽  
Atomic Force ◽  
Transmission Electron ◽  
Decay Times ◽  
Time Resolved Photoluminescence

ABSTRACTNanoscale InP islands are formed during InP/In0 48Ga0.52P heteroepitaxy due to the lattice mismatch of about 3.7%. The samples are prepared by solid source molecular beam epitaxy on (001) GaAs substrate. Atomic force microscopy measurements show that the size of the islands is typically 15 to 50 nm in diameter and about 5 to 10 nm high depending on the nominally deposited InP layer thickness, which is between 1 and 7.5 monolayers. Transmission electron micrographs show the coherent incorporation into the In0.48Ga0.52P matrix for InP islands with 2.5 monolayers. Resonantly excited time-resolved photoluminescence (PL) measurements of the self assembling InP dots are performed for optical characterisation. The decay times are typically 400 ps. The dependence on excitation power and temperature indicates the quantum dot nature of the InP islands. Finally a pronounced alignment of the InP islands is obtained on strained In0.61Ga0.39P buffer layers.

PL and FTIR Absorption Study on Porous Silicon in Situ During Etching, in Oxygen Ambient, and After Chemical Oxidation

1992 ◽  
Vol 283 ◽  
Author(s):  
G. Mauckner ◽  
T. Walter ◽  
T. Baier ◽  
K. Thonke ◽  
R. Sauer Abteilung
Keyword(s):  
Defect Density ◽  
Chemical Oxidation ◽  
Laser Exposure ◽  
Porous Si ◽  
Radiative Recombination Rate ◽  
Time Resolved ◽  
Radiative Defect ◽  
Recombination Lifetimes ◽  
Time Resolved Photoluminescence

ABSTRACTSteady state and time-resolved photoluminescence (PL) and Fourier-transform infrared (FTIR) spectroscopy have been performed in situ during etching, on “as prepared” porous Si in air under laser exposure and on chemically oxidized porous Si. We suppose that PLdegradation of “as prepared” porous Si is caused by creating non-radiative defect centers during photooxidation. Chemically oxidized porous Si shows increased PL intensity and longer recombination lifetimes as compared to non-oxidized samples. We conclude, that an oxide layer with low defect density on the inner surface of chemically oxidized porous Si reduces the non-radiative recombination rate.

HALL EFFECT, MAGNETORESISTIVITY AND MAGNETIC PROPERTIES OF MgB2 THIN FILMS WITH AlN BUFFER LAYERS

2008 ◽  
Vol 22 (08) ◽  
pp. 991-996
Author(s):  
G. ILONCA ◽  
T. R. YANG ◽  
A. V. POP ◽  
P. BALINT ◽  
M. BODEA ◽  
...  
Keyword(s):  
Thin Films ◽  
Upper Critical Field ◽  
Buffer Layers ◽  
Temperature Dependent ◽  
Sapphire Substrates ◽  
Anisotropic Coefficient ◽  
Aln Buffer ◽  
Mgb2 Thin Films ◽  
Sputtering System

MgB 2 thin films were deposited at low temperature substrates, in situ, on c-plane sapphire substrates, with the aluminium nitride (AlN) buffer layers, using the multiple-target sputtering system. The magnetoresistivities were measured using dc-five probe method in applied magnetic field up to 9 Tesla. The upper critical field anisotropy, HC2(T) and irreversibility field H irr (T) versus temperature were determined. The Hall coefficients RH are slightly temperature dependent and positive in the normal state. The critical temperature of 30–32 K and critical current density of 106-107 A/cm 2 at 4.2 K were obtained. Using extracted data, the coherence length ξo, anisotropic coefficient γ and penetration depth λL were calculated.

Correlation Between the AlN Buffer Layer Thickness and the GaN Polarity in GaN/AlN/Si(111) Grown by MBE

2002 ◽  
Vol 743 ◽  
Author(s):  
A. M. Sanchez ◽  
P. Ruterana ◽  
P. Vennegues ◽  
F. Semond ◽  
F. J. Pacheco ◽  
...  
Keyword(s):  
Low Temperature ◽  
Buffer Layer ◽  
Layer Thickness ◽  
Buffer Layers ◽  
Nucleation Layer ◽  
Buffer Layer Thickness ◽  
Aln Buffer

ABSTRACTIn this work it is shown that thin AlN buffer layers cause N-polarity GaN epilayers, with a high inversion domains density. When the AlN thickness increases, the polarity of the epilayer changes to Ga. The use of a low temperature AlN nucleation layer leads to a flat AlN/Si(111) interface. This contributes to decrease the inversion domains density in the overgrown GaN epilayer with a Ga polarity.

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