CHARACTERIZATION AND ELECTROCHROMIC PROPERTIES OF VANADIUM OXIDE THIN FILMS PREPARED VIA SPRAY PYROLYSIS

2013 ◽  
Vol 27 (21) ◽  
pp. 1350152 ◽  
Author(s):  
M. MOUSAVI ◽  
A. KOMPANY ◽  
N. SHAHTAHMASEBI ◽  
M.-M. BAGHERI-MOHAGHEGHI
Keyword(s):  
Thin Films ◽  
Substrate Temperature ◽  
Vanadium Oxide ◽  
Spray Pyrolysis ◽  
Cyclic Voltammogram ◽  
Oxide Thin Films ◽  
Electrochromic Properties ◽  
Spray Rate ◽  
Vanadium Oxide Thin Films ◽  
Deposited Films

Vanadium oxide thin films were grown on glass substrates using spray pyrolysis technique. The effects of substrate temperature, vanadium concentration in the initial solution and the solution spray rate on the nanostructural and the electrochromic properties of deposited films are investigated. Characterization and the electrochromic measurements were carried out using X-ray diffraction, scanning electron microscopy and cyclic voltammogram. XRD patterns showed that the prepared films have polycrystalline structure and are mostly mixed phases of orthorhombic α- V 2 O 5 along with minor β- V 2 O 5 and V 4 O 9 tetragonal structures. The preferred orientation of the deposited films was found to be along [101] plane. The cyclic voltammogram results obtained for different samples showed that only the films with 0.2 M solution concentration, 5 ml/min solution spray rate and 450°C substrate temperature exhibit two-step electrochromic properties. The results show a correlation between cycle voltammogram, morphology and resistance of the films.

Electrochromic properties of vanadium oxide thin films prepared by PSPT: Effect of substrate temperature

2013 ◽  
Author(s):  
C. E. Patil ◽  
P. R. Jadhav ◽  
N. L. Tarwal ◽  
H. P. Deshmukh ◽  
M. M. Karanjakar ◽  
...  
Keyword(s):  
Thin Films ◽  
Substrate Temperature ◽  
Vanadium Oxide ◽  
Oxide Thin Films ◽  
Electrochromic Properties ◽  
Vanadium Oxide Thin Films

Investigation on vanadium oxide thin films deposited by spray pyrolysis technique

2016 ◽  
Author(s):  
Mudaliar Mahesh Margoni ◽  
S. Mathuri ◽  
K. Ramamurthi ◽  
R. Ramesh Babu ◽  
K. Sethuraman
Keyword(s):  
Thin Films ◽  
Vanadium Oxide ◽  
Spray Pyrolysis ◽  
Spray Pyrolysis Technique ◽  
Oxide Thin Films ◽  
Vanadium Oxide Thin Films

First synthesis of vanadium oxide thin films by spray pyrolysis technique

2002 ◽  
Vol 95 (2) ◽  
pp. 141-147 ◽  
Author(s):  
A. Bouzidi ◽  
N. Benramdane ◽  
A. Nakrela ◽  
C. Mathieu ◽  
B. Khelifa ◽  
...  
Keyword(s):  
Thin Films ◽  
Vanadium Oxide ◽  
Spray Pyrolysis ◽  
Spray Pyrolysis Technique ◽  
Oxide Thin Films ◽  
Vanadium Oxide Thin Films

Nano-Polycrystalline Vanadium Oxide Thin Films Prepared by Pulsed Laser Deposition

2008 ◽  
Vol 8 (5) ◽  
pp. 2604-2608 ◽  
Author(s):  
Y. L. Wang ◽  
M. C. Li ◽  
X. K. Chen ◽  
G. Wu ◽  
J. P. Yang ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Substrate Temperature ◽  
Vanadium Oxide ◽  
Pulsed Laser Deposition ◽  
Oxygen Pressure ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Oxide Thin Films ◽  
Vanadium Oxide Thin Films

Nano-polycrystalline vanadium oxide thin films have been successfully produced by pulsed laser deposition on Si(100) substrates using a pure vanadium target in an oxygen atmosphere. The vanadium oxide thin film is amorphous when deposited at relatively low substrate temperature (500 °C) and enhancing substrate temperature (600–800 °C) appears to be efficient in crystallizing VOx thin films. Nano-polycrystalline V3O7 thin film has been achieved when deposited at oxygen pressure of 8 Pa and substrate temperature of 600 °C. Nano-polycrystalline VO2 thin films with a preferred (011) orientation have been obtained when deposited at oxygen pressure of 0.8 Pa and substrate temperatures of 600–800 °C. The vanadium oxide thin films deposited at high oxygen pressure (8 Pa) reveal a mix-valence of V5+ and V4+, while the VOx thin films deposited at low oxygen pressure (0.8 Pa) display a valence of V4+. The nano-polycrystalline vanadium oxide thin films prepared by pulsed laser deposition have smooth surface with high qualities of mean crystallite size ranging from 30 to 230 nm and Ra ranging from 1.5 to 22.2 nm. Relative low substrate temperature and oxygen pressure are benifit to aquire nano-polycrystalline VOx thin films with small grain size and low surface roughness.

Formation of Vanadium Oxide Thin Films Prepared from Aqueous Sol-Gel System

2014 ◽  
Vol 605 ◽  
pp. 79-82 ◽  
Author(s):  
Olivier Monfort ◽  
Tomas Roch ◽  
Maros Gregor ◽  
Leonid Satrapinskyy ◽  
Tomas Plecenik ◽  
...  
Keyword(s):  
Thin Films ◽  
Vanadium Oxide ◽  
Spin Coating ◽  
Gas Sensing ◽  
Sol Gel ◽  
Oxide Thin Films ◽  
Glass Substrates ◽  
Sensing Applications ◽  
Vanadium Oxide Thin Films ◽  
Deposited Films

Vanadium oxide thin films are promising materials for various applications. Much attention has been devoted to thermotropic VO2(M/R) films which exhibit semiconductor-conductor phase transition at 67 °C making them excellent materials for switching applications. Non-thermotropic VO2(B) films are semiconducting and have layered structure which makes them interesting for gas sensing applications. Vanadium pentoxide films are also of great interest for photocatalytic production of H2by H2O decomposition as well as for gas sensing. In this paper the preparation of vanadium oxide thin films by using the spin coating of V2O5·nH2O aqueous gel on Si/SiO2and lime-glass substrates is reported. The as-deposited films were annealed in either air or H2/Ar atmosphere at normal or low pressure in order to prepare V2O5and VO2thin films. The obtained samples were characterized by XRD and SEM.

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