In situDeep Etching for an InGaAlAs Buried Heterostructure by Using HCl Gas in a Metalorganic Vapor Phase Epitaxy Reactor
2004 ◽
Vol 43
(No. 10A)
◽
pp. L1247-L1249
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Keyword(s):
1999 ◽
Vol 38
(Part 1, No. 2B)
◽
pp. 1234-1238
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1994 ◽
Vol 145
(1-4)
◽
pp. 881-885
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Keyword(s):
2004 ◽
Vol 272
(1-4)
◽
pp. 125-130
◽
Keyword(s):
1991 ◽
Vol 107
(1-4)
◽
pp. 268-273
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