In-situ etching of InP and InGaAlAs materials by using HCl gas in metalorganic vapor-phase epitaxy

2004 ◽  
Vol 272 (1-4) ◽  
pp. 125-130 ◽  
Author(s):  
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T. Kitatani ◽  
K. Ouchi ◽  
H. Sato ◽  
M. Aoki
2004 ◽  
Vol 43 (No. 10A) ◽  
pp. L1247-L1249 ◽  
Author(s):  
Tomonobu Tsuchiya ◽  
Takeshi Kitatani ◽  
Kiyoshi Ouchi ◽  
Hiroshi Sato ◽  
Masahiko Aoki

2014 ◽  
Vol 407 ◽  
pp. 68-73 ◽  
Author(s):  
Guangxu Ju ◽  
Shingo Fuchi ◽  
Masao Tabuchi ◽  
Hiroshi Amano ◽  
Yoshikazu Takeda

1999 ◽  
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S. Laugt ◽  
P. Gibart

1994 ◽  
Vol 145 (1-4) ◽  
pp. 283-290 ◽  
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N. Hosoi ◽  
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H. Gotoh

1996 ◽  
Vol 69 (7) ◽  
pp. 928-930 ◽  
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M. L. McDonald ◽  
J. C. Bean ◽  
J. Vandenberg ◽  
T. L. Pernell ◽  
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