In-situ etching of InP and InGaAlAs materials by using HCl gas in metalorganic vapor-phase epitaxy
2004 ◽
Vol 272
(1-4)
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pp. 125-130
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Keyword(s):
2004 ◽
Vol 43
(No. 10A)
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pp. L1247-L1249
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Keyword(s):
2014 ◽
Vol 407
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pp. 68-73
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Keyword(s):
Keyword(s):
1994 ◽
Vol 145
(1-4)
◽
pp. 1-11
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1994 ◽
Vol 23
(2)
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pp. 167-173
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Keyword(s):
1994 ◽
Vol 145
(1-4)
◽
pp. 881-885
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