Extensive Leakage Current Reduction in Polymer Dielectric Thin Film by Metal Nanoparticles Incorporation for Organic Thin Film Transistor

2009 ◽  
Vol 48 (4) ◽  
pp. 04C171
Author(s):  
Ting-Hsiang Huang ◽  
Zingway Pei
2006 ◽  
Vol 7 (5) ◽  
pp. 271-275 ◽  
Author(s):  
Young H. Noh ◽  
S. Young Park ◽  
Soon-Min Seo ◽  
Hong H. Lee

Author(s):  
Yasuhiro Ogasahara ◽  
Kazunori Kuribara ◽  
Kunihiro Oshima ◽  
Zhaoxing Qin ◽  
Takashi Sato

Abstract This paper reports on a strategy for yield improvement and static leakage current reduction by using a standard cell design for large-scale organic thin-film transistor (OTFT) circuits. Printable or flexible devices are suitable for IoT nodes, and digital OTFT circuits comprise the peripheral circuits of such devices. Sufficiently high yields and low static power consumptions are essential for battery operations of IoT nodes having functional digital circuits. Our design method to address the weak n-type OTFT on-current results in improved logic gate yields without any cell area increase. We improved the yield of the inverter, NAND, and NOR gates using a standard cell design, and achieved a 100%yield for the inverter and NOR gates and 88%yield for the NAND gates. Signal propagations with rail-to-rail operation were measured on test chips. Leakage currents of 585 pA and 2.94 nA were achieved for the inverter and NOR gates, respectively.


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