Impact of Nitrogen Incorporation on Low-Frequency Noise of Polycrystalline Silicon/TiN/HfO$_{2}$/SiO$_{2}$ Gate-Stack Metal–Oxide–Semiconductor Field-Effect Transistors

2011 ◽  
Vol 50 (10) ◽  
pp. 10PB02 ◽  
Author(s):  
Takeo Matsuki ◽  
Ranga Hettiarachchi ◽  
Wei Feng ◽  
Kenji Shiraishi ◽  
Keisaku Yamada ◽  
...  
2008 ◽  
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pp. 094505 ◽  
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S. L. Rumyantsev ◽  
M. S. Shur ◽  
M. E. Levinshtein ◽  
P. A. Ivanov ◽  
J. W. Palmour ◽  
...  

2011 ◽  
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Philippe Gaubert ◽  
Akinobu Teramoto ◽  
Rihito Kuroda ◽  
Yukihisa Nakao ◽  
Hiroaki Tanaka ◽  
...  

2001 ◽  
Vol 90 (1) ◽  
pp. 310-314 ◽  
Author(s):  
S. L. Rumyantsev ◽  
N. Pala ◽  
M. S. Shur ◽  
R. Gaska ◽  
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