Atomic Scale Etch Depth Control and Low Damage Atomic-Layer Etching of
HfO2 Using BCl3 and Ar Neutral Beam
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2008 ◽
Vol 11
(4)
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pp. H71
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2005 ◽
Vol 8
(8)
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pp. C106
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2020 ◽
Vol 32
(8)
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pp. 3414-3426
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2020 ◽
Vol 38
(3)
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pp. 032603