Mono-Fractal Analyses of Roughness of Sputtered Films

2021 ◽  
pp. 101-136
Author(s):  
Fredrick Madaraka Mwema ◽  
Esther Titilayo Akinlabi ◽  
Oluseyi Philip Oladijo
Keyword(s):  
Sputtered Films ◽  
Fractal Analyses

Characterization of Sputtered Films using the Scanning Electron Microscope

1973 ◽  
Vol 31 ◽  
pp. 44-45
Author(s):  
R. F. Schneidmiller ◽  
W. F. Thrower ◽  
C. Ang
Keyword(s):  
Electron Microscope ◽  
Scanning Electron Microscope ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Sputtered Films ◽  
Plasma Sputtering ◽  
Microelectronic Devices ◽  
Control Film ◽  
Scanning Electron

Solid state materials in the form of thin films have found increasing structural and electronic applications. Among the multitude of thin film deposition techniques, the radio frequency induced plasma sputtering has gained considerable utilization in recent years through advances in equipment design and process improvement, as well as the discovery of the versatility of the process to control film properties. In our laboratory we have used the scanning electron microscope extensively in the direct and indirect characterization of sputtered films for correlation with their physical and electrical properties.Scanning electron microscopy is a powerful tool for the examination of surfaces of solids and for the failure analysis of structural components and microelectronic devices.

Analysis of Sputtered Zinc Oxide Films

1980 ◽  
Vol 38 ◽  
pp. 416-417
Author(s):  
T. A. Emma ◽  
M. P. Singh
Keyword(s):  
Electron Microscopy ◽  
Zinc Oxide ◽  
Piezoelectric Materials ◽  
Oxide Films ◽  
Optical Quality ◽  
Zno Films ◽  
Rf Power ◽  
X Ray Diffraction ◽  
Sputtered Films ◽  
Zinc Oxide Films

Optical quality zinc oxide films have been characterized using reflection electron diffraction (RED), replication electron microscopy (REM), scanning electron microscopy (SEM), and X-ray diffraction (XRD). Significant microstructural differences were observed between rf sputtered films and planar magnetron rf sputtered films. Piezoelectric materials have been attractive for applications to integrated optics since they provide an active medium for signal processing. Among the desirable physical characteristics of sputtered ZnO films used for this and related applications are a highly preferred crystallographic texture and relatively smooth surfaces. It has been found that these characteristics are very sensitive to the type and condition of the substrate and to the several sputtering parameters: target, rf power, gas composition and substrate temperature.

MICROMAGNETIC PROPERTIES OF AMORPHOUS CoxY1-x SPUTTERED FILMS WITH Mo OVERLAYERS

1988 ◽  
Vol 49 (C8) ◽  
pp. C8-1733-C8-1734
Author(s):  
J. M. Alameda ◽  
M. C. Contreras ◽  
D. Givord ◽  
A. Liénard
Keyword(s):  
Sputtered Films

Marked enhancement of synthetic-antiferromagnetic coupling in subnanocrystalline FeCoB∕Ru∕FeCoB sputtered films

2006 ◽  
Vol 89 (3) ◽  
pp. 032511 ◽  
Author(s):  
Atsushi Hashimoto ◽  
Shin Saito ◽  
Kazumi Omori ◽  
Hiroshi Takashima ◽  
Tomonori Ueno ◽  
...  
Keyword(s):  
Antiferromagnetic Coupling ◽  
Sputtered Films ◽  
Marked Enhancement

Co-sputtered films within the quasi-binary system TiN-TiB2

1997 ◽  
Vol 94-95 ◽  
pp. 297-302 ◽  
Author(s):  
P. Losbichler ◽  
C. Mitterer ◽  
P.N. Gibson ◽  
W. Gissler ◽  
F. Hofer ◽  
...  
Keyword(s):  
Binary System ◽  
Sputtered Films ◽  
Quasi Binary System
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