scholarly journals Chemical Vapor Growth of Titanium Diboride Whisker

1975 ◽  
Vol 48 (11) ◽  
pp. 3156-3160 ◽  
Author(s):  
Seiji Motojima ◽  
Fumio Sugimori ◽  
Yasutaka Takahashi ◽  
Kohzo Sugiyama
1978 ◽  
Vol 43 (4) ◽  
pp. 533-536 ◽  
Author(s):  
Kohzo Sugiyama ◽  
Shigeru Iwakoshi ◽  
Seiji Motojima ◽  
Yasutaka Takahashi

1976 ◽  
Vol 7 (5) ◽  
pp. no-no
Author(s):  
SEIJI MOTOJIMA ◽  
FUMIO SUGIMORI ◽  
YASUTAKA TAKAHASHI ◽  
KOHZO SUGIYAMA

Nanoscale ◽  
2018 ◽  
Vol 10 (40) ◽  
pp. 19014-19022 ◽  
Author(s):  
Martin Grönke ◽  
Peer Schmidt ◽  
Martin Valldor ◽  
Steffen Oswald ◽  
Daniel Wolf ◽  
...  

This work demonstrates an elegant way to synthesize α-RuCl3 nanosheets down to the monolayer limit by chemical vapor transport and subsequent delamination techniques.


1981 ◽  
Vol 20 (11) ◽  
pp. 2251-2252 ◽  
Author(s):  
Hiroshi Ogawa ◽  
Mitsuhiro Nishio

1974 ◽  
Vol 26 (2) ◽  
pp. 203-209 ◽  
Author(s):  
Takehiko Takahashi ◽  
Hideo Kamiya

2002 ◽  
Vol 744 ◽  
Author(s):  
G.A. Verozubova ◽  
A. I. Gribenyukov ◽  
M.C. Ohmer ◽  
N.C. Fernelius ◽  
J.T. Goldstein

ABSTRACTThermodynamic analysis of the vapor phase over ZnGeP2 in Zn-Ge-P-Cl system has been carried out. The analysis showed that this system can be used for the vapor growth of ZnGeP2. Homoepitaxial layers of ZnGeP2 were grown in a closed system using chemical vapor transport. Electrical and photoluminescence properties of the layers were studied, and crystal lattice parameters were measured. Comparison of properties for bulk and vapor grown ZnGeP2 crystals were carried out. It was found that the vapor grown crystals have more perfect structure than the bulk ones, particularly, they have significantly lower vacancy concentration.


2007 ◽  
Vol 334-335 ◽  
pp. 329-332 ◽  
Author(s):  
Min Ki Kim ◽  
Dong Phil Kim ◽  
Gui Yung Chung

Titanium diboride (TiB2) appears to be an attractive candidate for a high-temperature fiber reinforced composites. Chemical Vapor Infiltration (CVI) has been carried out for the preparation of TiB2/C composites. Titanium diboride has been deposited from the gas mixtures of TiCl4, BCl3, and H2 in the furnace at the reaction temperatures between 850 to 950 °C and about 20 torr. Effects of infiltration parameters such as temperature, reaction time, and concentrations of BCl3 and H2 have been studied. Analyses with SEM, TGA and XPS were carried out. The amount of deposition in the preform increased with the increases of the reaction time, temperature and the flow rate of BCl3. The activation energy of the whole deposition reaction could be estimated from the Arrhenius plot.


2009 ◽  
Vol 311 (2) ◽  
pp. 362-367 ◽  
Author(s):  
A. Abrutis ◽  
V. Plausinaitiene ◽  
M. Skapas ◽  
C. Wiemer ◽  
W. Gawelda ◽  
...  
Keyword(s):  
Hot Wire ◽  

1981 ◽  
Vol 55 (3) ◽  
pp. 611-613 ◽  
Author(s):  
Seiji Motojima ◽  
Kohzo Sugiyama
Keyword(s):  

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